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Sputtering Targets

Sputtering targets, ince film kaplama işlemlerinde kullanılan özel malzemelerdir. "Sputtering" (püskürtme) yöntemiyle fiziksel buhar biriktirme (PVD - Physical Vapor Deposition) işlemlerinde kullanılırlar. Bu malzemeler, genellikle saf metaller, alaşımlar, oksitler veya nitrürlerden oluşur.

✅ Yüksek saflık ve homojenlik sağlar
✅ Çok ince, hassas ve dayanıklı kaplamalar üretir
✅ Düşük sıcaklıkta kaplama yaparak ısıya duyarlı malzemeleri korur
✅ Yüksek aşınma direnci ve korozyon önleme avantajı sunar
Metal Sputtering Targets
  • Aluminum Sputtering Targets
  • Antimony Sputtering Targets
  • Barium Sputtering Targets
  • Bismuth Sputtering Targets
  • Boron Sputtering Targets
  • Copper Sputtering Targets
  • Carbon Sputtering Targets
  • Carbon (Graphite) Sputtering Targets
  • Carbon (Pyrolytic Graphite) Sputtering Targets
  • Chromium Sputtering Targets
  • Cobalt Sputtering Targets
  • Germanium Sputtering Targets
  • Indium Sputtering Targets
  • Iron Sputtering Targets
  • Lead Sputtering Targets
  • Magnesium Sputtering Targets
  • Nickel Sputtering Targets
  • Tin Sputtering Targets
  • Silicon (Si) (undoped) Sputtering Targets
  • Silicon (Si (P-type)) Sputtering Targets
  • Silver Sputtering Targets
  • Niobium Sputtering Targets
  • Tungsten Sputtering Targets
  • Permalloy Sputtering Targets
  • Platinum Sputtering Targets
  • Praseodymium Sputtering Targets
  • Selenium Sputtering Targets
  • Silicon (Si (N-type)) Sputtering Targets
  • Strontium Titanate Sputtering Targets
  • Tantalum Sputtering Targets
  • Manganese Sputtering Targets
  • Molybdenum Sputtering Targets
  • Vanadium Sputtering Targets
  • Yttrium Sputtering Targets
  • Zinc Sputtering Targets
Oksit Sputtering Targets
  • Aluminum Oxide Sputtering Targets
  • Cerium Oxide Sputtering Targets
  • Bismuth Oxide Sputtering Targets
  • Chromium Oxide Sputtering Targets
  • Erbium Oxide Sputtering Targets
  • Indium Oxide Sputtering Targets
  • Iron Oxide Sputtering Targets
  • Magnesium Oxide Sputtering Targets
  • Nickel Oxide Sputtering Targets
  • Niobium Oxide Sputtering Targets
  • Silicon Dioxide (Fused Quartz) Sputtering Targets
  • Tantalum Oxide Sputtering Targets
  • Tin Oxide Sputtering Targets
  • Tungsten Oxide Sputtering Targets
  • Vanadium Oxide Sputtering Targets
  • Ytterbium Oxide Sputtering Targets
  • Zinc Oxide Sputtering Targets
  • Cerium Oxide Sputtering Targets
  • Erbium Oxide Sputtering Targets
  • Ytterbium Oxide Sputtering Targets
Alaşım Sputtering Targets
  • Aluminum Nitride Sputtering Targets
  • Aluminum Silicon Sputtering Targets
  • Aluminum Silicon Copper Sputtering Targets
  • Antimony Telluride Sputtering Targets
  • Barium Fluoride Sputtering Targets
  • Barium Titanate Sputtering Targets
  • Barium Strontium Titanate Sputtering Targets
  • Barium Zirconate Sputtering Targets
  • Bismuth Ferrite Sputtering Targets
  • Bismuth Ferrite (indium) Sputtering Targets
  • Bismuth Telluride Sputtering Targets
  • Boron Carbide Sputtering Targets
  • Boron Nitride Sputtering Targets
  • Calcium Manganate Sputtering Targets
  • Cobalt Iron Boron Sputtering Targets
  • Indium Tin Oxide (ITO) Sputtering Targets
  • Indium Zinc Oxide Sputtering Targets
  • Lanthanum Manganate Sputtering Targets
  • Lanthanum Aluminate (indium) Sputtering Targets
  • Lanthanum Calcium Manganate (La0.7Ca0.3MnO3)
  • Lanthanum Nickel Oxide Sputtering Targets
  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)
  • Lanthanum Strontium Manganate (La0.7Sr0.3MnO3)
  • Lanthanum Titanate Sputtering Targets
  • Lead Zirconium Titanate, PZT Sputtering Targets
  • Lithium Cobalt Oxide Sputtering Targets
  • Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2)
  • Lithium Niobate Sputtering Targets
  • Lithium Phosphate Sputtering Targets
  • Lithium Titanate Sputtering Targets
  • Magnesium Fluoride Sputtering Targets
  • Molybdenum Disilicide Sputtering Targets
  • Molybdenum Disulfide Sputtering Targets
  • Molybdenum Oxide Sputtering Targets
  • Nickel Chromium Sputtering Targets
  • Nickel Iron Sputtering Targets
  • Nickel Vanadium Sputtering Targets
  • Praseodymium Calcium Manganate Sputtering Targets
  • Silicon Nitride Sputtering Targets
  • Silicon Carbide Sputtering Targets
  • Titanium Boride Sputtering Targets
  • Titanium Dioxide Sputtering Targets
  • Titanium Carbide Sputtering Targets
  • Titanium Nitride Sputtering Targets
  • Tungsten Disulfide Sputtering Targets
  • Tungsten Titanium Sputtering Targets
  • Yttrium Ferrite Sputtering Targets
  • Zinc Oxide with Alumina Sputtering Targets
  • Zinc Sulfide Sputtering Targets
  • Lanthanum Aluminate (indium) Sputtering Targets
  • Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets
  • Lanthanum Manganate Sputtering Targets
  • Lanthanum Nickel Oxide Sputtering Targets
  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets
  • Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets
  • Lanthanum Titanate Sputtering Targets
  • Praseodymium Calcium Manganate Sputtering Targets
  • Yttrium Ferrite Sputtering Targets
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