Gelişen teknoloji ile birlikte nanoteknoloji, birçok sektörde çığır açan yeniliklere öncülük etmektedir. Nanoteknolojik ürünler, sağlık, enerji, elektronik, malzeme bilimi ve daha pek çok alanda verimliliği artırmak ve yeni olanaklar sunmak için tasarlanmıştır. Firmamız, sektöre özel ihtiyaçları karşılayan geniş bir ürün yelpazesi ile nanoteknoloji alanında lider konumdadır.
Kategorilerimiz, her biri belirli bir bilimsel ve endüstriyel ihtiyaca odaklanan çeşitli ürünleri içermektedir. Bu kategoriler, müşterilerimizin doğru ürünü kolayca bulmasını sağlamak amacıyla titizlikle düzenlenmiştir.
Başlıca Ürün Kategorilerimiz
1. Karbon Nanotüpler
Karbon nanotüpler, üstün mekanik, termal ve elektriksel özellikleri ile tanınır. Elektronik, enerji depolama, kompozit malzemeler ve medikal uygulamalarda kullanılmaktadır.
2. Grafen
Grafen, mükemmel iletkenliği ve mekanik dayanımı ile geleceğin malzemesi olarak kabul edilir. Grafen bazlı ürünlerimiz, çeşitli endüstriler için yenilikçi çözümler sunar.
3. Nanoparçacıklar
Nanoparçacıklar, sağlık, enerji ve kimya sektörlerinde önemli rol oynar. Altın, gümüş, titanyum ve diğer element bazlı nanoparçacıklar, özel uygulamalarda kullanılmak üzere tasarlanmıştır.
4. Mikropartiküller
Mikropartiküller, daha büyük boyutlarda özel uygulamalar için kullanılır. Özellikle kaplama teknolojileri ve malzeme geliştirme alanlarında tercih edilmektedir.
5. Fullerenler
Fullerenler, kimyasal ve fiziksel dayanıklılıkları ile dikkat çeken karbon türevi malzemelerdir. Araştırma ve geliştirme projelerinde yaygın olarak kullanılmaktadır.
6. Şekil Hafıza Malzemeleri
Bu malzemeler, sıcaklık değişimlerine yanıt vererek eski formlarına dönebilme özellikleri ile bilinir. Tıbbi cihazlardan otomotiv sektörüne kadar geniş bir kullanım alanına sahiptir.
7. 3D Yazıcı Malzemeleri
3D yazıcılar için sunduğumuz özel malzemeler, prototip oluşturma ve üretim süreçlerini optimize etmek isteyen müşteriler için idealdir. Yüksek kaliteli titanyum, nikel ve diğer metal tozları mevcuttur.
8. Batarya Malzemeleri
Enerji depolama çözümleri için ileri teknoloji batarya malzemelerimiz, lityum-iyon bataryalardan yenilikçi enerji depolama teknolojilerine kadar uzanmaktadır.
9. Laboratuvar Ekipmanları
Araştırma ve geliştirme çalışmalarını desteklemek amacıyla tasarlanan laboratuvar ekipmanlarımız, hassas ölçümler ve işlemler için uygundur.
10. Dağılımlar ve Püskürtme Hedefleri
Dağılımlar, kaplama ve yüzey işleme teknolojilerinde sıklıkla kullanılırken, püskürtme hedefleri ince film kaplama süreçleri için vazgeçilmezdir.
Neden Bizi Tercih Etmelisiniz?
- Kalite Garantisi: Tüm ürünlerimiz, uluslararası standartlara uygun olarak üretilmektedir.
- Geniş Ürün Yelpazesi: Sektörünüze uygun ürünleri kolayca bulabilirsiniz.
- Teknik Destek: Uzman ekibimiz, ürün seçiminden uygulama süreçlerine kadar size destek olmaya hazırdır.
Nanoteknolojinin sunduğu sınırsız olanakları keşfetmek için ürünlerimizi inceleyin ve sektörünüzde fark yaratın!
Newly Released Products
Popular Products
Quantum Dots
Lead Sulfide Quantum Dots (PbS QD)
Carbon Quantum Dots (CQD)
Graphene Quantum Dots (GQD)
Perovskite Quantum Dots
QLED Quantum Dots
Indium Phosphide Quantum Dots (InP-ZnS QD)
Zinc Selenide Quantum Dots (ZnSe-ZnS QD)
Cadmium Selenide Quantum Dots (CdSe-ZnS)
Carbon Nanotubes
Single-Walled CNTs
Carbon Nanotube Fibers
MWCNT
Short Length MWCNT
Aligned MWCNT
Advanced Carbon Nanotubes
Double-Walled CNTs
Graphitized Multi-Walled CNTs
Short Length Multi-Walled CNTs
DWCNT
Graphitized MWCNT
CNT Dispersions
Carbon Nanotube Nanoribbon
Carbon Nanotube Sponges
Multi-Walled CNTs
Graphene
Graphene Dispersion
Graphene Nanoplatelets
Graphene Sheet
Graphene Oxide
CVD Graphene
Functionalized Graphene
Holey Super Graphene
Graphene Aerogels
Nanoparticles
Elemental Nanoparticles
Carbon Nanoparticles
Silicon Nanoparticles
Gold Nanoparticles
Silver Nanoparticles
Element & Alloys Nanoparticles
Silver Nanoparticles
Aluminum Nanoparticles
Gold Nanoparticles
Platinum Nanoparticles
Boron Nanoparticles
Bismuth Nanoparticles
Carbon Nanoparticles
Cobalt Nanoparticles
Chromium Nanoparticles
Copper Nanoparticles
Iron Nanoparticles
Indium Nanoparticles
Molybdenum Nanoparticles
Nickel Nanoparticles
Silicon Nanoparticles
Tin Nanoparticles
Sulphur Nanoparticles
Tantalum Nanoparticles
Titanium Nanoparticles
Tungsten Nanoparticles
Zinc Nanoparticles
Alloy Nanoparticles
Cu-Zn Nanoparticles
Al-Si Alloy Nanoparticles
Cu-Ni Nanoparticles
Fe-Ni Nanoparticles
Fe-Si Nanoparticles
Selenium Nanoparticles
Single Metal Oxide Nanoparticles
Indium Oxide Nanoparticles
Aluminum Oxide Nanoparticles
Aluminum Hydroxide Nanoparticles
Bismuth Oxide Nanoparticles
Cerium Oxide Nanoparticles
Cobalt Oxide Nanoparticles
Chromium Oxide Nanoparticles
Copper Oxide Nanoparticles
Cuprous Oxide Nanoparticles
Dysprosium Oxide Nanoparticles
Erbium Oxide Nanoparticles
Europium Oxide Nanoparticles
Iron Oxide Nanoparticles
Gadolinium Oxide Nanoparticles
Hafnium Oxide Nanoparticles
Indium Hydroxide Nanoparticles
Lanthanum Oxide Nanoparticles
Magnesium Oxide Nanoparticles
Magnesium Hydroxide Nanoparticles
Magnesium Carbonate Nanoparticles
Molybdenum Trioxide Nanoparticles
Manganese Oxide Nanoparticles
Neodymium Oxide Nanoparticles
Antimony Trioxide Nanoparticles
Nickel Hydroxide Nanoparticles
Nickel Oxide Nanoparticles
Praseodymium Oxide Nanoparticles
Silicon Dioxide Nanoparticles
Samarium Oxide Nanoparticles
Tin Dioxide Nanoparticles
Terbium Oxide Nanoparticles
Titanium Dioxide Nanoparticles
Tungsten Trioxide Nanoparticles
Yttrium Oxide Nanoparticles
Zinc Oxide Nanoparticles
Zinc Carbonate Nanoparticles
Zirconium Oxide Nanoparticles
Cesium Tungsten Oxide Nanoparticles
Vanadium Oxide Nanoparticles
Calcium Oxide Nanoparticles
Platinum Oxide Nanoparticles
Boron Oxide Nanoparticles
Magnetic Nanoparticles
Magnetic Powders of Fe2O3
Magnetic Powders of Fe3O4
Multi-Element Oxide Nanoparticles
Barium Iron Oxide (BaFe12O19) Nanoparticles
Barium Carbonate (BaCO3) Nanoparticles
Barium Titanate (BaTiO3) Nanoparticles
Indium Tin Oxide (ITO) Nanoparticles
Antimony Tin Oxide (ATO) Nanoparticles
Manganese Iron Oxide (MnFe2O4) Nanoparticles
Nickel Iron Oxide (NiFe2O4) Nanoparticles
Nickel Cobalt Iron Oxide Nanoparticles
Strontium Titanate (SrTiO3) Nanoparticles
Yttrium Aluminate (Y3Al5O12) Nanoparticles
Zinc Iron Oxide (ZnFe2O4) Nanoparticles
Zinc Cobalt Iron Oxide Nanoparticles
Zinc Manganese Iron Oxide Nanoparticles
Titanium Oxynitride Nanoparticles
Cesium Tungsten Oxide (Cs0.33WO3) Nanoparticles
Manganese Carbonate (MnCO3) Nanoparticles
Lead Zirconate Titanate (PZT) Nanoparticles
Magnesium Carbonate (MgCO3) Nanoparticles
Lithium Metaborate (LiBO2) Nanoparticles
Cobalt Iron Oxide (CoFe2O4) Nanoparticles
Yttrium Oxyfluoride (YOF) Nanoparticles
Compounds Nanoparticles
Aluminum Nitride (AlN) Nanoparticles
Boron Nitride (BN) Nanoparticles
Boron Carbide (B4C) Nanoparticles
Chromium Carbide (Cr3C2) Nanoparticles
Hafnium Carbide (HfC) Nanoparticles
Lanthanum Trifluoride (LaF3) Nanoparticles
Silicon Carbide (SiC) Nanoparticles
Silicon Nitride (Si3N4) Nanoparticles
Tantalum Carbide (TaC) Nanoparticles
Titanium Boride (TiB2) Nanoparticles
Titanium Carbide (TiC) Nanoparticles
Titanium Nitride (TiN) Nanoparticles
Vanadium Carbide (VC) Nanoparticles
Tungsten Carbide (WC) Nanoparticles
Tungsten Disulfide (WS2) Nanoparticles
Zirconium Diboride (ZrB2) Nanoparticles
Zirconium Carbide (ZrC) Nanoparticles
Vanadium Nitride
Silicon Hexaboride (SiB6) Nanoparticles
Hafnium Diboride Nanoparticles
Hydroxyapatite Nanoparticles
Zirconium Hydride (ZrH2) Nanoparticles
Molybdenum Disulfide (MoS2) Nanoparticles
Cadmium Selenide (CdSe) Nanoparticles
Cuprous Oxide (Cu2O) Nanoparticles
Cadmium Sulfide (CdS) Nanoparticles
Bismuth Sulfide (Bi2S3) Nanoparticles
PTFE Nanoparticles
Antibacterial Nanopowder
Yttrium Fluoride (YF3) Nanoparticles
Calcium Copper Titanate Nano Powder
Tungsten Carbide Cobalt (WC-Co) Nanoparticles
Nanocellulose
Cellulose Nanocrystal
Cellulose Nanofiber
Cellulose Suspension
Microparticles
Elemental Micron Powder
Silver Micron Powder
Boron Micron Powder
Magnesium Micron Powder
Manganese Micron Powder
Niobium Micron Powder
Silicon Micron Powder
Zirconium Micron Powder
Indium Micron Powder
Scandium Micron Powder
Cerium Micron Powder
Lanthanum Micron Powder
Yttrium Micron Powder
Praseodymium Micron Powder
Neodymium Micron Powder
Samarium Micron Powder
Europium Micron Powder
Gadolinium Micron Powder
Terbium Micron Powder
Dysprosium Micron Powder
Holmium Micron Powder
Erbium Micron Powder
Thulium Micron Powder
Ytterbium Micron Powder
Aluminum Micron Powder
Antimony Micron Powder
Bismuth Micron Powder
Carbon Micron Powder
Cadmium Micron Powder
Cobalt Micron Powder
Chromium Micron Powder
Copper Micron Powder
Iron Micron Powder
Germanium Micron Powder
Hafnium Micron Powder
Molybdenum Micron Powder
Nickel Micron Powder
Lead Micron Powder
Tin Micron Powder
Tantalum Micron Powder
Tellurium Micron Powder
Titanium Micron Powder
Zinc Micron Powder
Vanadium Micron Powder
Tungsten Micron Powder
Selenium Micron Powder
Sulphur Micron Powder
Beryllium Micron Powder
Phosphorus Micron Powder
Barium Micron Powder
Compound Micron Powder
Carbon Nitride Micron Powder
Carbon Titanium Nitride (TiNC) Micron Powder
Silicon Carbide (SiC) Micron Powder
Carbon Aluminum Nitride (AlNC) Micron Powder
Boron Carbide (B4C) Micron Powder
Chromium Nitride (CrN) Micron Powder
Lanthanum Hexaboride (LaB6) Micron Powder
Magnesium Nitride (Mg3N2) Micron Powder
Molybdenum Carbide (Mo2C) Micron Powder
Molybdenum Disilicide (MoSi2) Micron Powder
Niobium Carbide (NbC) Micron Powder
Titanium Diboride (TiB2) Micron Powder
Zirconium Diboride (ZrB2) Micron Powder
Zirconium Nitride (ZrN) Micron Powder
Zirconium Hydride (ZrH2) Micron Powder
Lithium Fluoride Powder
Tantalum Carbide (TaC) Micron Powder
Silicon Nitride (Si3N4) Micron Powder
Tungsten Carbide (WC) Micron Powder
Titanium Carbide (TiC) Micron Powder
Graphite Micron Powder
Molybdenum Disulfide (MoS2) Micron Powder
Cadmium Selenide (CdSe) Micron Powder
Hydroxyapatite Micron Powder
Boron Nitride (BN) Micron Powder
Titanium Hydride (TiH2) Micron Powder
Tungsten Disulfide (WS2) Micron powder
Graphite Fluoride Micron Powder
Bakelite Micron Powder
Calcium Copper Titanate Micron Powder
Single Metal Oxide Micron Powder
Antimony Trioxide Micron Powder
Aluminum Oxide Micron Powder
Bismuth Trioxide Micron Powder
Scandium Oxide Micron Powder
Lanthanum Oxide Micron Powder
Praseodymium Oxide Micron Powder
Neodymium Oxide Micron Powder
Samarium Oxide Micron Powder
Europium Oxide Micron Powder
Gadolinium Oxide Micron Powder
Terbium Oxide Micron Powder
Dysprosium Oxide Micron Powder
Holmium Oxide Micron Powder
Erbium Oxide Micron Powder
Thulium Oxide Micron Powder
Lutetium Oxide Micron Powder
Cerium Oxide Micron Powder
Chromium Oxide Micron Powder
Cobalt Oxide Micron Powder
Cuprous Oxide Micron Powder
Hafnium Oxide Micron Powder
Indium Oxide Micron Powder
Indium Hydroxide Micron Powder
Magnesium Oxide Micron Powder
Manganese Dioxide Micron Powder
Molybdenum Trioxide Micron Powder
Nickel Oxide Micron Powder
Lead Oxide Micron Powder
Selenium Dioxide Micron Powder
Titanium Dioxide Micron Powder
Tantalum Pentoxide Micron Powder
Tungsten Trioxide Micron Powder
Zinc Oxide Micron Powder
Copper Oxide Micron Powder
Iron Oxide Micron Powder
Calcium Oxide Micron Powder
Tellurium Dioxide Micron Powder
MAX Phase Powders
Alloy Micron Powder
ZK60 Magnesium Alloy Powder
Magnesium Alloy Powder
Ni-Ti Alloy Powder
Type 316 Stainless Steel Powder
Iron Nickel Alloy Powder
AZ31 Magnesium Alloy Powder
Al 7075 Alloy Powder
Aluminum Zirconium Alloy Powder
Chromium Cobalt Alloy Powder
AZ91 Magnesium Alloy Powder
Copper Tin Alloy Powder
Nickel Chromium Alloy Powder
Al 6061 Alloy Powder
Al 2024 Alloy Powder
Multi-Element Oxide Micron Powder
Zinc Titanate Micron Powder
Barium Titanate Micron Powder
Magnesium Carbonate Micron Powder
Magnesium Hydroxide Micron Powder
Polyether Ether Ketone Micron Powder
Strontium Titanate Micron Powder
Titanium Silicon Carbide Micron Powder
Titanium Aluminum Carbide Micron Powder
Barium Ferrite Micron Powder
Strontium Iron Oxide Micron Powder
Manganese Ferrite Black Oxide Micron Powder
Fullerene
Fullerene-C60
Fullerene-C70
Polyhydroxylated Fullerene (Fullerenols)
Conductive Adhesive Paste
Silver Paste
Carbon Paste
Silicon Wafer & Semiconductor Wafer
Borosilicate Glass Wafers
CZ-Si Wafers
FZ-Si Wafers
Si + SiO2 Wafers
Quartz Wafer
Fused Silica Wafers
Si + SiNx Wafers
Wafer Shippers
Indium Phosphide (InP) Wafers
GaAs Wafer
Silicon on Insulator (SOI) wafers
Silicon carbide Wafer ( SiC-4H ) – 4H
Gallium Antimonide (GaSb) wafers
Silicon carbide Wafer ( SiC-6H ) – 6H
Indium Arsenide (InAs) Wafers
Dispersions
Metal and Oxide Dispersions
Graphene Dispersions
Carbon Nanotube Dispersions
Borophene Dispersion
Silicene Dispersion
Rare Earth Materials
Rare Earth Oxide Powder
Rare Earth Compound Powder
Rare Earth Element Powder
Rare Earth Sputtering Targets
Sputtering Targets
Sputtering Targets Names D – M
Sputtering Targets Names T – Z
Sputtering Targets Names T – Z
Sputtering Targets Names A – C
Sputtering Targets Names D – M
Sputtering Targets Names N – S
Shape Memory Materials
Shape Memory Polymers
NGM-Ether Type Shape Memory Polymer
NGP-Potting Type Shape Memory Polymer
NGS-Solution Type Shape Memory Polymer
Shape Memory Alloys
Shape Memory Alloy Wires
Shape Memory Alloy Sheets
3D Printer Materials
Dispersion Equipment
Homogenizer
Three Roll Mill
High Energy Ball Mill
Hydrothermal Synthesis Autoclave Reactors
Roll to Roll PE-CVD
Energy
Battery Materials
Newly Released Products -> Yeni Çıkan Ürünler
Popular Products -> Popüler Ürünler
Quantum Dots -> Kuantum Noktalar
Lead Sulfide Quantum Dots (PbS QD) -> Kurşun Sülfür Kuantum Noktaları (PbS QD)
Carbon Quantum Dots (CQD) -> Karbon Kuantum Noktaları (CQD)
Graphene Quantum Dots (GQD) -> Grafen Kuantum Noktaları (GQD)
Perovskite Quantum Dots -> Perovskit Kuantum Noktalar
QLED Quantum Dots -> QLED Kuantum Noktalar
Indium Phosphide Quantum Dots (InP-ZnS QD) -> İndiyum Fosfit Kuantum Noktaları (InP-ZnS QD)
Zinc Selenide Quantum Dots (ZnSe-ZnS QD) -> Çinko Selenit Kuantum Noktaları (ZnSe-ZnS QD)
Cadmium Selenide Quantum Dots (CdSe-ZnS) -> Kadmiyum Selenit Kuantum Noktaları (CdSe-ZnS)
Carbon Nanotubes -> Karbon Nanotüpler
Single-Walled CNTs -> Tek Duvarlı Karbon Nanotüpler
Carbon Nanotube Fibers -> Karbon Nanotüp Lifler
MWCNT -> Çok Duvarlı Karbon Nanotüpler
Short Length MWCNT -> Kısa Çok Duvarlı Karbon Nanotüpler
Aligned MWCNT -> Hizalanmış Çok Duvarlı Karbon Nanotüpler
Advanced Carbon Nanotubes -> Gelişmiş Karbon Nanotüpler
Double-Walled CNTs -> Çift Duvarlı Karbon Nanotüpler
Graphitized Multi-Walled CNTs -> Grafitlenmiş Çok Duvarlı Karbon Nanotüpler
Short Length Multi-Walled CNTs -> Kısa Çok Duvarlı Karbon Nanotüpler
DWCNT -> Çift Duvarlı Karbon Nanotüpler
Graphitized MWCNT -> Grafitlenmiş Çok Duvarlı Karbon Nanotüpler
CNT Dispersions -> Karbon Nanotüp Dağılımları
Carbon Nanotube Nanoribbon -> Karbon Nanotüp Nano Şerit
Carbon Nanotube Sponges -> Karbon Nanotüp Süngerler
Multi-Walled CNTs -> Çok Duvarlı Karbon Nanotüpler
Graphene -> Grafen
Graphene Dispersion -> Grafen Dağılımı
Graphene Nanoplatelets -> Grafen Nano Plakalar
Graphene Sheet -> Grafen Levha
Graphene Oxide -> Grafen Oksit
CVD Graphene -> CVD Grafen
Functionalized Graphene -> Fonksiyonel Grafen
Holey Super Graphene -> Delikli Süper Grafen
Graphene Aerogels -> Grafen Aerojeller
Nanoparticles -> Nanoparçacıklar
Microparticles -> Mikropartiküller
Fullerene -> Fulleren
Conductive Adhesive Paste -> İletken Yapıştırıcı Macun
Silicon Wafer & Semiconductor Wafer -> Silikon Wafer ve Yarı İletken Wafer
Dispersions -> Dağılımlar
Rare Earth Materials -> Nadir Toprak Malzemeler
Sputtering Targets -> Püskürtme Hedefleri
Shape Memory Materials -> Şekil Hafıza Malzemeleri
3D Printer Materials -> 3D Yazıcı Malzemeleri
Lab Equipment -> Laboratuvar Ekipmanları
Battery Materials -> Batarya Malzemeleri
Yeni Çıkan Ürünler
Popüler Ürünler
Kuantum Noktaları
Kurşun Sülfür Kuantum Noktaları (PbS QD)
Karbon Kuantum Noktaları (CQD)
Grafen Kuantum Noktaları (GQD)
Perovskit Kuantum Noktaları
QLED Kuantum Noktaları
İndiyum Fosfit Kuantum Noktaları (InP-ZnS QD)
Çinko Selenid Kuantum Noktaları (ZnSe-ZnS QD)
Kadmiyum Selenit Kuantum Noktaları (CdSe-ZnS)
Karbon Nanotüpler
Tek Duvarlı CNT’ler
Karbon Nanotüp Elyafları
MWCNT
Kısa Boy MWCNT
Hizalanmış MWCNT
Gelişmiş Karbon Nanotüpler
Çift Duvarlı CNT’ler
Grafitlenmiş Çok Duvarlı CNT’ler
Kısa Uzunlukta Çok Duvarlı CNT’ler
DWCNT
Grafitleştirilmiş MWCNT
CNT Dağılımları
Karbon Nanotüp Nanoşerit
Karbon Nanotüp Süngerler
Çok Duvarlı CNT’ler
Grafen
Grafen Dağılımı
Grafen Nanoplateletler
Grafen Sayfası
Grafen Oksit
CVD Grafen
İşlevselleştirilmiş Grafen
Holey Süper Grafen
Grafen Aerojelleri
Nanopartiküller
Element Nanopartikülleri
Karbon Nanopartikülleri
Silikon Nanopartikülleri
Altın Nanopartiküller
Gümüş Nanopartiküller
Element ve Alaşımlar Nanopartiküller
Gümüş Nanopartiküller
Alüminyum Nanopartiküller
Altın Nanopartiküller
Platin Nanopartiküller
Bor Nanopartikülleri
Bizmut Nanopartikülleri
Karbon Nanopartikülleri
Kobalt Nanopartikülleri
Krom Nanopartikülleri
Bakır Nanopartiküller
Demir Nanopartikülleri
İndiyum Nanopartikülleri
Molibden Nanopartikülleri
Nikel Nanopartikülleri
Silikon Nanopartikülleri
Kalay Nanopartikülleri
Kükürt Nanopartikülleri
Tantal Nanopartiküller
Titanyum Nanopartikülleri
Tungsten Nanopartikülleri
Çinko Nanopartikülleri
Alaşım Nanopartikülleri
Cu-Zn Nanopartikülleri
Al-Si Alaşım Nanopartikülleri
Cu-Ni Nanopartikülleri
Fe-Ni Nanopartikülleri
Fe-Si Nanopartikülleri
Selenyum Nanopartikülleri
Tek Metal Oksit Nanopartikülleri
İndiyum Oksit Nanopartikülleri
Alüminyum Oksit Nanopartikülleri
Alüminyum Hidroksit Nanopartikülleri
Bizmut Oksit Nanopartikülleri
Seryum Oksit Nanopartikülleri
Kobalt Oksit Nanopartikülleri
Krom Oksit Nanopartikülleri
Bakır Oksit Nanopartikülleri
Bakır Oksit Nanopartikülleri
Disprosyum Oksit Nanopartikülleri
Erbiyum Oksit Nanopartikülleri
Evropiyum Oksit Nanopartikülleri
Demir Oksit Nanopartikülleri
Gadolinyum Oksit Nanopartikülleri
Hafniyum Oksit Nanopartikülleri
İndiyum Hidroksit Nanopartikülleri
Lantan Oksit Nanopartikülleri
Magnezyum Oksit Nanopartikülleri
Magnezyum Hidroksit Nanopartikülleri
Magnezyum Karbonat Nanopartikülleri
Molibden Trioksit Nanopartikülleri
Manganez Oksit Nanopartikülleri
Neodim Oksit Nanopartikülleri
Antimon Trioksit Nanopartikülleri
Nikel Hidroksit Nanopartikülleri
Nikel Oksit Nanopartikülleri
Praseodim Oksit Nanopartikülleri
Silikon Dioksit Nanopartikülleri
Samaryum Oksit Nanopartikülleri
Kalay Dioksit Nanopartikülleri
Terbiyum Oksit Nanopartikülleri
Titanyum Dioksit Nanopartikülleri
Tungsten Trioksit Nanopartikülleri
İtriyum Oksit Nanopartikülleri
Çinko Oksit Nanopartikülleri
Çinko Karbonat Nanopartikülleri
Zirkonyum Oksit Nanopartikülleri
Lityum Metaborat (LiBO2) Nanopartikülleri
Kobalt Demir Oksit (CoFe2O4) Nanopartikülleri
İtriyum Oksiflorür (YOF) Nanopartikülleri
Bileşikler Nanopartiküller
Alüminyum Nitrür (AlN) Nanopartikülleri
Bor Nitrür (BN) Nanopartikülleri
Bor Karbür (B4C) Nanopartikülleri
Krom Karbür (Cr3C2) Nanopartikülleri
Hafniyum Karbür (HfC) Nanopartikülleri
Lantan Triflorür (LaF3) Nanopartikülleri
Silisyum Karbür (SiC) Nanopartikülleri
Silisyum Nitrür (Si3N4) Nanopartikülleri
Tantal Karbür (TaC) Nanopartikülleri
Titanyum Borür (TiB2) Nanopartikülleri
Titanyum Karbür (TiC) Nanopartikülleri
Titanyum Nitrür (TiN) Nanopartikülleri
Vanadyum Karbür (VC) Nanopartikülleri
Tungsten Karbür (WC) Nanopartikülleri
Tungsten Disülfür (WS2) Nanopartikülleri
Zirkonyum Diborür (ZrB2) Nanopartikülleri
Zirkonyum Karbür (ZrC) Nanopartiküller
Vanadyum Nitrür
Silikon Heksaborür (SiB6) Nanopartikülleri
Hafniyum Diborür Nanopartikülleri
Hidroksiapatit Nanopartikülleri
Zirkonyum Hidrit (ZrH2) Nanopartikülleri
Molibden Disülfür (MoS2) Nanopartikülleri
Kadmiyum Selenit (CdSe) Nanopartikülleri
Bakır Oksit (Cu2O) Nanopartikülleri
Kadmiyum Sülfür (CdS) Nanopartikülleri
Bizmut Sülfür (Bi2S3) Nanopartikülleri
PTFE Nanopartikülleri
Antibakteriyel Nanotoz
İtriyum Florür (YF3) Nanopartikülleri
Kalsiyum Bakır Titanat Nano Tozu
Tungsten Karbür Kobalt (WC-Co) Nanopartikülleri
Nanoselüloz
Selüloz Nanokristal
Selüloz Nanofiber
Sezyum Tungsten Oksit Nanopartikülleri
Vanadyum Oksit Nanopartikülleri
Kalsiyum Oksit Nanopartikülleri
Platin Oksit Nanopartikülleri
Bor Oksit Nanopartikülleri
Manyetik Nanopartiküller
Fe2O3’ün Manyetik Tozları
Fe3O4’ün Manyetik Tozları
Çok Elementli Oksit Nanopartiküller
Baryum Demir Oksit (BaFe12O19) Nanopartikülleri
Baryum Karbonat (BaCO3) Nanopartikülleri
Baryum Titanat (BaTiO3) Nanopartikülleri
İndiyum Kalay Oksit (ITO) Nanopartikülleri
Antimon Kalay Oksit (ATO) Nanopartikülleri
Manganez Demir Oksit (MnFe2O4) Nanopartikülleri
Nikel Demir Oksit (NiFe2O4) Nanopartikülleri
Nikel Kobalt Demir Oksit Nanopartikülleri
Stronsiyum Titanat (SrTiO3) Nanopartikülleri
İtriyum Alüminat (Y3Al5O12) Nanopartiküller
Çinko Demir Oksit (ZnFe2O4) Nanopartikülleri
Çinko Kobalt Demir Oksit Nanopartikülleri
Çinko Manganez Demir Oksit Nanopartikülleri
Titanyum Oksinitrid Nanopartiküller
Sezyum Tungsten Oksit (Cs0.33WO3) Nanopartiküller
Manganez Karbonat (MnCO3) Nanopartikülleri
Kurşun Zirkonat Titanat (PZT) Nanopartikülleri
Magnezyum Karbonat (MgCO3) Nanopartikülleri
Selüloz Süspansiyonu
Mikropartiküller
Element Mikron Tozu
Gümüş Mikron Tozu
Bor Mikron Tozu
Magnezyum Mikron Tozu
Manganez Mikron Tozu
Niyobyum Mikron Tozu
Silikon Mikron Tozu
Zirkonyum Mikron Tozu
İndiyum Mikron Tozu
Skandiyum Mikron Tozu
Seryum Mikron Tozu
Lantan Mikron Tozu
İtriyum Mikron Tozu
Praseodimyum Mikron Tozu
Neodim Mikron Tozu
Samaryum Mikron Tozu
Europium Mikron Tozu
Gadolinyum Mikron Tozu
Terbiyum Mikron Tozu
Disprosyum Mikron Tozu
Holmiyum Mikron Tozu
Erbiyum Mikron Tozu
Tülyum Mikron Tozu
İterbiyum Mikron Tozu
Alüminyum Mikron Tozu
Antimon Mikron Tozu
Bizmut Mikron Tozu
Karbon Mikron Tozu
Kadmiyum Mikron Tozu
Kobalt Mikron Tozu
Krom Mikron Tozu
Bakır Mikron Tozu
Demir Mikron Tozu
Germanyum Mikron Tozu
Hafniyum Mikron Tozu
Molibden Mikron Tozu
Nikel Mikron Tozu
Kurşun Mikron Tozu
Kalay Mikron Tozu
Tantal Mikron Tozu
Tellür Mikron Tozu
Titanyum Mikron Tozu
Çinko Mikron Tozu
Vanadyum Mikron Tozu
Tungsten Mikron Tozu
Selenyum Mikron Tozu
Kükürt Mikron Tozu
Berilyum Mikron Tozu
Fosfor Mikron Tozu
Baryum Mikron Tozu
Bileşik Mikron Tozu
Karbon Nitrür Mikron Tozu
Karbon Titanyum Nitrür (TiNC) Mikron Tozu
Silisyum Karbür (SiC) Mikron Tozu
Karbon Alüminyum Nitrür (AlNC) Mikron Tozu
Bor Karbür (B4C) Mikron Tozu
Krom Nitrür (CrN) Mikron Tozu
Lantan Hekzaborür (LaB6) Mikron Tozu
Magnezyum Nitrür (Mg3N2) Mikron Tozu
Molibden Karbür (Mo2C) Mikron Tozu
Molibden Disilisit (MoSi2) Mikron Tozu
Niyobyum Karbür (NbC) Mikron Tozu
Titanyum Diborür (TiB2) Mikron Tozu
Zirkonyum Diborür (ZrB2) Mikron Tozu
Zirkonyum Nitrür (ZrN) Mikron Tozu
Zirkonyum Hidrit (ZrH2) Mikron Tozu
Lityum Florür Tozu
Tantal Karbür (TaC) Mikron Tozu
Silikon Nitrür (Si3N4) Mikron Tozu
Tungsten Karbür (WC) Mikron Tozu
Titanyum Karbür (TiC) Mikron Tozu
Grafit Mikron Tozu
Molibden Disülfür (MoS2) Mikron Tozu
Kadmiyum Selenit (CdSe) Mikron Tozu
Hidroksiapatit Mikron Tozu
Bor Nitrür (BN) Mikron Tozu
Titanyum Hidrit (TiH2) Mikron Tozu
Tungsten Disülfür (WS2) Mikron tozu
Grafit Florür Mikron Tozu
Bakalit Mikron Tozu
Kalsiyum Bakır Titanat Mikron Tozu
Tek Metal Oksit Mikron Tozu
Antimon Trioksit Mikron Tozu
Alüminyum Oksit Mikron Tozu
Bizmut Trioksit Mikron Tozu
Skandiyum Oksit Mikron Tozu
Lantan Oksit Mikron Tozu
Praseodimyum Oksit Mikron Tozu
Neodimyum Oksit Mikron Tozu
Samaryum Oksit Mikron Tozu
Europium Oksit Mikron Tozu
Gadolinyum Oksit Mikron Tozu
Terbiyum Oksit Mikron Tozu
Disprosyum Oksit Mikron Tozu
Holmiyum Oksit Mikron Tozu
Erbiyum Oksit Mikron Tozu
Tülyum Oksit Mikron Tozu
Lutesyum Oksit Mikron Tozu
Seryum Oksit Mikron Tozu
Krom Oksit Mikron Tozu
Kobalt Oksit Mikron Tozu
Bakır Oksit Mikron Tozu
Hafniyum Oksit Mikron Tozu
İndiyum Oksit Mikron Tozu
İndiyum Hidroksit Mikron Tozu
Magnezyum Oksit Mikron Tozu
Manganez Dioksit Mikron Tozu
Molibden Trioksit Mikron Tozu
Nikel Oksit Mikron Tozu
Kurşun Oksit Mikron Tozu
Selenyum Dioksit Mikron Tozu
Titanyum Dioksit Mikron Tozu
Tantal Pentoksit Mikron Tozu
Tungsten Trioksit Mikron Tozu
Çinko Oksit Mikron Tozu
Bakır Oksit Mikron Tozu
Demir Oksit Mikron Tozu
Kalsiyum Oksit Mikron Tozu
Tellür Dioksit Mikron Tozu
MAX Faz Tozları
Alaşım Mikron Tozu
ZK60 Magnezyum Alaşım Tozu
Magnezyum Alaşım Tozu
Ni-Ti Alaşım Tozu
Tip 316 Paslanmaz Çelik Tozu
Demir Nikel Alaşım Tozu
AZ31 Magnezyum Alaşım Tozu
Al 7075 Alaşım Tozu
Alüminyum Zirkonyum Alaşım Tozu
Krom Kobalt Alaşım Tozu
AZ91 Magnezyum Alaşım Tozu
Bakır Kalay Alaşım Tozu
Nikel Krom Alaşım Tozu
Al 6061 Alaşım Tozu
Al 2024 Alaşım Tozu
Çok Elementli Oksit Mikron Tozu
Çinko Titanat Mikron Tozu
Baryum Titanat Mikron Tozu
Magnezyum Karbonat Mikron Tozu
Magnezyum Hidroksit Mikron Tozu
Polieter Eter Keton Mikron Tozu
Stronsiyum Titanat Mikron Tozu
Titanyum Silisyum Karbür Mikron Tozu
Titanyum Alüminyum Karbür Mikron Tozu
Baryum Ferrit Mikron Tozu
Stronsiyum Demir Oksit Mikron Tozu
Manganez Ferrit Siyah Oksit Mikron Tozu
Fulleren
Fulleren-C60
Fulleren-C70
Polihidroksillenmiş Fulleren (Fullerenoller)
İletken Yapıştırıcı
Gümüş Pasta
Karbon Macunu
Silikon Gofret ve Yarı İletken Gofret
Borosilikat Cam Gofretler
CZ-Si Gofretler
FZ-Si Gofretler
Si + SiO2 Gofretleri
Kuvars Gofret
Erimiş Silika Gofretler
Si + SiNx Gofretler
Gofret Nakliyecileri
İndiyum Fosfit (InP) Gofretler
GaAs Gofret
Yalıtkan (SOI) plakalar üzerindeki silikon
Silisyum karbür Gofret (SiC-4H) – 4H
Galyum Antimonid (GaSb) levhalar
Silisyum karbür Gofret (SiC-6H) – 6H
İndiyum Arsenit (InAs) Gofretler
Dispersiyonlar
Metal ve Oksit Dispersiyonları
Grafen Dispersiyonları
Karbon Nanotüp Dispersiyonları
Borofen Dispersiyonu
Silisin Dispersiyonu
Nadir Toprak Malzemeleri
Nadir Toprak Oksit Tozu
Nadir Toprak Bileşik Tozu
Nadir Toprak Element Tozu
Nadir Toprak Püskürtme Hedefleri
Püskürtme Hedefleri
Püskürtme Hedeflerinin İsimleri D – M
Püskürtme Hedeflerinin İsimleri T – Z
Püskürtme Hedeflerinin İsimleri T – Z
Püskürtme Hedeflerinin İsimleri A – C
Püskürtme Hedeflerinin İsimleri D – M
Püskürtme Hedeflerinin İsimleri N – S
Şekil Hafızalı Malzemeler
Şekil Hafızalı Polimerler
NGM-Eter Tipi Şekil Hafızalı Polimer
NGP-Çömlekçilik Tipi Şekil Hafızalı Polimer
NGS-Çözüm Tipi Şekil Hafızalı Polimer
Şekil Hafızalı Alaşımlar
Şekil Hafızalı Alaşımlı Teller
Şekil Hafızalı Alaşım Levhalar
3D Yazıcı Malzemeleri
Dispersiyon Ekipmanları
Homojenizatör
Üç Valsli Değirmen
Yüksek Enerjili Bilyalı Değirmen
Hidrotermal Sentez Otoklav Reaktörleri
Rulodan Ruloya PE-CVD
Enerji
Pil Malzemeleri
Graphene Sheet, Size: 1 cm x 1 cm, Thickness: 35 µm, Highly Conductive
Nitinol Shape Memory Alloy Sheet, Thickness: 2 mm, AF: -10 – -15°C
Magnesium Hydroxide (Mg(OH)2) Micron Powder, Purity: 99.95+%, Size: 325 mesh
Silicon Carbide (SiC) Micron Powder, Purity: 99,9%, Size: 250 µm
Nitinol Shape Memory Alloy Sheet, Thickness: 1 mm, AF: 50-55°C
Nitinol Shape Memory Alloy Sheet, Thickness: 0,5 mm, AF: 80-85°C
Nitinol Shape Memory Alloy Sheet, Thickness: 0,5 mm, AF: 35-40°C
Magnesium Carbonate (MgCO3) Micron Powder, Purity: 99.9+%, Size: 325 mesh
Iron Oxide (Fe2O3) Micron Powder, Gamma, Purity 99.9+%, Size: 325 mesh
Activated Carbon (C) Nanopowder/Nanoparticles, Purity: 95%, Size: <100 nm, Charcoal
no image available
Natural Graphite (C) Nanopowder/Nanoparticles, Purity: 99.9% Size: 380 nm-1.2 um
Iron Oxide (Fe3O4) Micron Powder, Purity: 99.9+%, Size: 325 mesh
Silicon Carbide (SiC) Micron Powder, Purity: 99.9%, Size: 325 mesh
Nitinol Shape Memory Alloy Sheet, Thickness: 0,15 mm, AF: 15-20°C
Silicon Carbide (SiC) Micron Powder, Purity: 99,9%, Size: 1 µm
Antibacterial Nanopowder/Nanoparticles, Size: 100 nm
Copper Tin (Cu:85-Sn:15) Alloy Micron Powder, Purity: 99.5+%, Size: 325 mesh
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Gamma, Purity: 99.55%, Size: 78 nm, Hydrophilic
Iron Oxide (Fe2O3) Micron Powder, Gamma, Purity: 99.9+%, Size: 1 µm
Graphene Nanoplatelet, Purity: 99.9%, Size: 3 nm, S.A: 800 m2/g, Dia: 1.5 μm
Coin Style Single Wafer Shipper, 3’’ / 76 mm , Natural PP
Titanium Dioxide (TiO2) Micron Powder, Purity: 99.5+ %, Size: 325 mesh
Copper Tin (Bronze, Cu:80-Sn:20) Alloy Micron Powder, Purity: 99.95%, Size: 325 mesh
Titanium Diboride (TiB2) Micron Powder, Purity: 99.5+%, Size: 40-50 µm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.95+%, Size: 50-100 µm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99+%, Size: 10 µm, Fused
Coin Style Single Wafer Shipper, 2’’ / 51 mm , Natural PP
Copper (Cu) Micron Powder, Purity: 99.9 %, Size: 325 mesh, Spherical
Coin Style Single Wafer Shipper, 5’’ / 125 mm , Natural PP
Samarium Oxide (Sm2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Titanium Diboride (TiB2) Micron Powder, Purity: 99.5+%, Size: 200 mesh
Graphene Nanoplatelet, Purity: 99.9+%, Size: 3 nm, S.A: 320 m2/g, Dia: 1.5 μm
Boron Carbide (B4C) Micron Powder, Purity: 95+%, Size: 325 mesh
Coin Style Single Wafer Shipper, 6’’ / 150 mm , Natural PP
Coin Style Single Wafer Shipper, 4’’ / 100 mm , Natural PP
Graphene Nanoplatelet, Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 7 μm
Tellurium Dioxide (TeO2) Micron Powder, Purity: 99.95 %, Size: 1-5 µm
Graphene Nanoplatelet, Purity: 99.9+%, Size: 3 nm, S.A: 530 m2/g, Dia: 1.5 μm
Tellurium (Te) Micron Powder, Purity: 99.95 %, Size: 325 mesh
Boron Carbide (B4C) Micron Powder, Purity: 99.95%, Size: < 10 µm
Iron Oxide (Fe3O4) Micron Powder, Purity: 99.5+%, Size: 1 µm
Nickel (Ni) Micron Powder, Purity: 99.99 %, Size: 10 µm
Silicon Nitride (Si3N4) Micron Powder, Beta, Purity: 99.9%, Size: 10 µm
Nickel (Ni) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Porous Carbon (C) Nanopowder/Nanoparticles, Size: 18-38 nm, (Plant)
Graphene Sheet, Size: 5cm x 5cm, Thickness: 35 µm, Highly Conductive
Nanocalcite, Purity: 99.9%, Size: <200 nm
Silicon Nitride (Si3N4) Micron Powder, Beta, Purity: 99.9%, Size: 325 mesh
Strontium Titanate (SrTiO3) Micron Powder, Purity: 99.9+%, Size: 3 µm
Boron Carbide (B4C) Micron Powder, Purity: 95+%, Size: 250 µm
Graphene Nanoplatelet, Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 30 μm
Conductive Carbon Black Nanopowder/Nanoparticles, Purity: 95%, Size: 148 nm (Plant)
Silicon (Si) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Graphene Nanoplatelet, Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 7 μm
AZ91 Magnesium Alloy Powder, Purity: 99.95%, Size: 15-53 μm
Graphite Micron Powder, Purity: 99.9%, Size: 5-10 µm
Graphene Nanoplatelet, Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 18 μm
Water-_19_.webp
Lanthanum Oxide (La2O3) Micron Powder, Purity: 99.99%, Size: 1-10 μm
Titanium Carbide (TiC) Micron Powder, Purity: 99,9+%, Size: 325 mesh
Graphene Nanoplatelet, Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 18 μm
Cobalt (Co) Nanopowder/Nanoparticles, Purity: 99.85%, Size: 28 nm, Partially Passivated
Hydroxyapatite Powder, Purity: 99.5+%, Size: 40-50 µm
Hydroxyapatite Powder, Purity: 99.5+%, Size: 10-20 µm
Copper Oxide (CuO) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 38 nm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Alpha, Purity: 99.5+%, Size: 78 nm, Hydrophilic
Graphene Nanoplatelet, Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 30 μm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Gamma, Purity: 99.5+%, Size: 18 nm, Hydrophilic
Manganese (Mn) Micron Powder, Purity: 99.95%, Size: 35 µm, Metal Basis
Indium Hydroxide (In(OH)3) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Sulphur (S) Micron Powder, Purity: 99.9%, Size: 325 mesh
Zinc (Zn) Micron Powder, Purity: 99.9%, Size: 3 µm
Tungsten Carbide (WC) Micron Powder, Purity: 99,9%, Size: -325 mesh
Molybdenum (Mo) Micron Powder, Purity: 99.95%, Size: 1-10 µm, Metal Basis
Barium Ferrite (BaFe12O19) Micron Powder, Purity: 99.9+%, Size: 1-3 µm
Titanium Carbide (TiC) Micron Powder, Purity: 99.99%, Size: 1 µm
Nickel (Ni) Micron Powder, Purity: 99.95 %, Size: 500 Mesh, Spherical
Titanium Hydride (TiH2) Micron Powder, Purity: 99.5%, Size: 325 mesh
Activated Carbon (C) Nanopowder/Nanoparticles, Size: < 90 nm, Coconut
Graphene Sheet, Size: 10 cm x 10 cm, Thickness: 35 µm, Highly Conductive
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99+%, Size: Sub-Micron, Fused
Silicon Dioxide(SiO2) Micron Powder, Size: -325 mesh,Purity: 99.9%
PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)], Purity: 99.9%
Chromium (Cr) Micron Powder, Purity: 99.9 %, Size: 100 mesh
Conductive Bakelite Powder
Hydroxyapatite Micron Powder, Purity: 99.5+%, Size: 3 µm
Strontium Iron Oxide (SrFe12O19) Micron Powder, Purity: 99.9+%, Size: 1-3 µm
Barium (Ba) Micron Powder, Purity: 99.9+%, Size: 325 mesh
Zinc (Zn) Micron Powder, Purity: 99.9%, Size: 325 mesh
Aluminum (Al) Micron Powder, Purity: 99.9+ %, Size: 55 µm
Copper Oxide (CuO) Micron Powder, Purity: 99.5%, Size: 20 µm
Aluminum (Al) Micron Powder, Purity: 99.9+%, Size: 20-35 µm
Cuprous Oxide (Cu2O) Micron Powder, Purity: 99.99 %, Size: -200 mesh
Neodymium (Nd) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Aluminum (Al) Micron Powder, Purity: 99.9+%, Size: 1-2 µm
Boron Carbide (B4C) Micron Powder, Purity: 95+%, Size: 1-3 µm
Calcium Oxide (CaO) Micron Powder, Purity: 99.95+ %, Size: < 5 µm
Molybdenum Disilicide (MoSi2) Micron Powder, Purity: 99.5+%, Size: 1-10 µm
Silicon Dioxide (SiO2) Micron Powder, Size: <15 Micron, Purity: 99.8%
Aluminum (Al) Micron Powder, Purity: 99.9+ %, Size: 30 µm
Niobium (Nb) Micron Powder, Purity: 99.95%, Size: 45 µm, Metal Basis
Sodium Dodecyl Sulfate Micron Powder, Size: -325 mesh
Chromium(III) oxide (Cr2O3) Micron Powder, Purity: 99%, Average Particle Size: 4.5µm
Carbon Nanotubes Doped with 12 wt% Graphene Nanopowder/Nanoparticles
Lithium Metaborate (LiBO2) Nanopowder/Nanoparticles, Purity: 99.95+ %, Size: 500 nm, Metals Basis
Niobium (Nb) Micron Powder, Purity: 99.95 %, Size: 10 µm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water, Alpha, Size: 28 nm, 22 wt%
Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 90 nm, Cubic
Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 280 nm, Tetragonal
Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 370 nm, Tetragonal
Molybdenum Disulfide (MoS2) Micron Powder, Purity: 99.9+%, Size: 325 mesh
Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 500 nm, Tetragonal
Silicon (Si) Micron Powder, Purity: 99.95%, Size: 1-3 um, Polycrystalline
Aluminum (Al) Micron Powder, Purity: 99.9 %, Size: 100 mesh
Aluminum (Al) Micron Powder, Purity: 99.95 %, Size: 70 µm
Nickel Iron Oxide (NiFe2O4) Nanopowder/Nanoparticles, Purity: 98.99%, Size: 25 nm
Bismuth (Bi) Micron Powder, Purity: 99.9 %, Size: 200 mesh
Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: < 55 nm
Iron Oxide (Fe3O4) Nanopowder/Nanoparticles, Purity: 98.45+%, Size: 18-28 nm
Iron Oxide (Fe2O3) Nanopowder/Nanoparticles, Gamma, Purity: 99.55%, Size: 18-38 nm
Antimony (III) Oxide (Sb2O3) Micron Powder, Purity: 99.9%, Size: 3 µm
Graphite (C) Micron Powder, Purity: 99.9%, Size: 1-5 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 600-850 μm
Phosphorus (P) Micron Powder, Purity: 99.95%, Size: 1 µm, Metal Basis
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 300-425 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 250-355 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 212-300 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 180-250 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 850-1180 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 150-212 μm
Lithium Hydroxide, Monohydrate (Battery Grade, LiOH.H2O), Purity: ≥ 99.0%
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 125-180 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 90-125 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 63-106 μm
Silicon (Si) Micron Powder, Purity: 99.99 %, Size: 10 µm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 53-90 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 1180-1700 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 1400-2000 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 45-75 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 34-82 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 28-70 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 22-59 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 16-49 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 12-40 μm
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 8-32 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 5-25 μm
Activated Carbon Micron Powder, Size: 8-30 Mesh
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 3-19 μm
Zinc (Zn) Micron Powder, Purity: 99.9%, Size: 200 mesh
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 2-14 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 355-500 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 425-600 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 500-710 μm
Tantalum (Ta) Micron Powder, Purity: 99.9 %, Size: 3 µm
Nickel Chromium (Ni-Cr) Alloy Micron Powder, Size: 325 mesh, Ni-80%, Cr-20%
Tin (Sn) Micron Powder, Purity: 99.95 %, Size: 1 µm
Zinc (Zn) Nanopowder/Nanoparticles, Purity: 99.95%,Size: 790 nm
Gadolinium Oxide (Gd2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Zinc Iron Oxide (ZnFe2O4) Nanopowder/Nanoparticles, Purity: 98.7%, Size: 8-28 nm
Aluminum (Al) Micron Powder, Purity: 99.95 %, Size: 80 µm
Iron (Fe) Micron Powder, Purity: 99.5+ %, Size: 325 mesh
Aluminum (Al) Micron Powder, Purity: 99.95+ %, Size: 14 µm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 106-150 μm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 1000-1400 μm
Nickel Oxide (NiO) Micron Powder, Purity: 99.9 %, Size: 200 mesh, Black
Manganese (Mn) Micron Powder, Purity: 99.99 %, Size: 10 µm
Calcium Oxide (CaO) Micron Powder, Purity: 99.9 %, Size: 325 mesh
Holmium (Ho) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles, S-type, Spherical, Purity: 99.95+%, Size: 13-22 nm, Nonporous and Amorphous
Aluminum Oxide (Al2O3) Micron Powder, Alpha, Purity: 99.9%, Size: 20 µm
Aluminum (Al) Micron Powder, Purity: 99.9+%, Size: 9-11 µm
Tantalum (Ta) Micron Powder, Purity: 99.9 %, Size: 10 µm
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles, P-type, Purity: 99.65+%, Size: 13-23 nm, Porous and Amorphous
Calcium Copper Titanate (CaCu3Ti4O12) Micron Powder, D50:1-3um, Purity: ≥ 99.5 %
Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles, Purity: 99.955%, Size: 13-47 nm
Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm
Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Zinc Oxide (ZnO) Micron Powder, Purity: 99.9+%, Size: 20 µm
Tin (Sn) Micron Powder, Purity: 99.95 %, Size: 15 µm
Zinc Oxide (ZnO) Micron Powder, Purity: 99.5%, Size: 325 mesh, White
Molybdenum Trioxide (MoO3) Micron Powder, Purity: 99.9 %, Size: 325 mesh
Silver (Ag) Nanopowder/Nanoparticles, Purity: 99.95+%, Size: 20 nm, metal basis
(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 20-40 nm
Carbon Nanofibers, Purity: > 95%, Outside Diameter: 50-150 nm
(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm
Aluminum (Al) Micron Powder, Purity: 99.99 %, Size: 325 mesh, Spherical
(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm
Zirconium (Zr) Micron Powder, Purity: 99.5%, Size: 80 µm, Metal Basis
Activated Carbon Micron Powder, Size: 4000 µm
Vulcan XC72 Conductive Carbon Black
Lanthanum Oxide (La2O3) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 8-190 nm
Cobalt (Co) Micron Powder, Purity: 99.9%, Size: 10 µm
Boron Nitride (BN) Micron Powder, Purity: 99.7%, Size: 40-50 µm, Hexagonal
Activated Carbon Micron Powder, Size: 2000 µm
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 780 nm, Metal Basis
Zinc Ferrite (ZnFe2O4) Micron Powder, Zinc Iron Oxide Micron Powder, -200 mesh, 99.9%
Activated Carbon Micron Powder, Size: 1500 µm
Silver (Ag) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 28-48 nm, Metal Basis
Titanium Dioxide (TiO2) Micron Powder, Purity: 99.5+%, Size: 20 µm
Silver (Ag) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 28-48 nm, w/~0.25% PVP
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Alpha, High Purity: 99.95%, Size: 290 nm, Hydrophilic
Polyether Ether Ketone (PEEK) Micron Powder, Purity: 99.95+ %, Size: <325 mesh
Silver (Ag) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 48-78 nm, metal basis
Barium Carbonate (BaCO3) Nanopowder/Nanoparticles, Purity: 99.98%, Size: 780 nm
Aluminum (Al) Micron Powder, Purity: 99.9+ %, Size: 7 µm
Cadmium (Cd) Micron Powder, Purity: 99.99 %, Size: 200 mesh, Irregular
Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55%, Size: 790 nm
Chromium (Cr) Micron Powder, Purity: 99.9 %, Size: 10 µm
Silver (Ag) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 18 nm, w/~0.25% PVP
Tungsten Disulfide Micron powder, WS2, 99.9%, 325 mesh
Tin Oxide (SnO2) Nanopowder/Nanoparticles, High Purity: 99.87%, Size: 30-60 nm
Aluminum (Al) Micron Powder, Purity: 99.9+ %, Size: 5 µm
Copper Oxide (CuO) Nanopowder/Nanoparticles, Purity: 99.5%, Size: < 77 nm
Magnesium Hydroxide (Mg(OH)2) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 8 nm
Silver (Ag) Micron Powder, Purity: 99.99 %, Size: Sub-Micron
Lithium Titanium Oxide (Li4Ti5O12) Micron Powder for Li-ion Battery Anode (LTO)
Bismuth Oxide (Bi2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 75-195 nm
Aluminum Hydroxide (Al(OH)3) Nanopowder/Nanoparticles, High Purity: 99.95%, Size: 8-18 nm, Hydrophilic
Silver-_Ag_-Micron-Powder-99.9_-1-3-um.webp
Silver (Ag) Micron Powder, Purity: 99.9 %, Size: 1-3 µm
Porous Carbon (C) Nanopowder/Nanoparticles, Purity: 95%, Size: 55-75 nm, (Plant)
Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-57 nm
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles, Amorphous, Purity: 98.5+%, Size: 55-75 nm
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles, Amorphous, Purity: 99.5+%, Size: 15-35 nm
Tungsten Oxide (WO3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 55 nm, Tetragonal
Selenium (Se) Micron Powder, Purity: 99.9%, Size: 325 mesh
Zirconium Hydride (ZrH2) Micron Powder, Purity: 99.5+%, Thickness: 1- 10 µm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Alpha, High Purity: 99.95%, Size: 136 nm, Hydrophilic
Titanium (Ti) Micron Powder, Purity: 99.5+%, Size: 325 mesh
Antimony (Sb) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Silicon (Si) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 90nm
(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Manganese Iron Oxide (MnFe2O4) Nanopowder/Nanoparticles, Purity: 98.95%, Size: 55 nm
Nickel (Ni) Micron Powder, Purity: 99.5+%, Size: 325 mesh, Spherical
Boron (B) Nanopowder/Nanoparticles, Purity: 99.55+%, Size: 450 nm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 34-82 μm
Graphite (C) Micron Powder, Purity: ≥99.99%, Size: < 45 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 1400-2000 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+% , Size: 1180-1700 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 1000-1400 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 850-1180 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 600-850 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 500-710 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 425-600 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 355-500 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 300-425 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 250-355 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 212-300 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 180-250 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 150-212 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 125-180 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 106-150 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 90-125 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 63-106 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 53-90 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 45-75 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 28-70 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 22-59 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99+%, Size: 16-49 µm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 12-40 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 8-32 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 5-25 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 3-19 μm
Silicon Carbide (SiC) Micron Powder, Purity: 99.5+%, Size: 2-14 μm
Manganese Ferrite Black Oxide Micron Powder, (Fe,Mn)3O4, 94+%, -325 mesh
Nickel Oxide (NiO) Micron Powder, Purity: 99.9 %, Size: 325 mesh, Green
Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, Purity: 99.999%, Size: 25-50 nm
Nickel Oxide (NiO) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 8-18 nm
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles, Purity: 95.9+%, Size: 18-35 nm, KH570 Coated
Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: < 90 nm
Antimony-Oxide-400-nm-99-.webp
Antimony Oxide (Sb2O3) Nanopowder/Nanoparticles, Purity: 99+%, Size: 400 nm
Zirconium (II) Hydride (ZrH2) Micron Powder, Purity: 99.9+%, Size: <10 µm
Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion, Size: 25-45 nm, 22 wt%
Nickel Oxide (NiO) Nanopowder/Nanoparticles, High Purity: 99.55+%, Size: 10-40 nm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Amorphous, Size: 45 nm, Al2O3: 92 wt%, H2O: 6-7 wt%
Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 18 nm
Hafnium Oxide (HfO2) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 55-75 nm
Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 35 nm
Tungsten Carbide (WC) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 55 nm
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles, Purity: 96.3+%, Size: 18-35 nm, KH550 Coated
Barium Titanate (BaTiO3) Micron Powder, Purity: > 99 %, Size: 1-3 µm
Hafnium Oxide (HfO2) Micron Powder, Purity: 99.9+%, Size: 1 µm
Silver (Ag) Doped Antibacterial Nanopowder/Nanoparticles, Size: 100 nm
Hydroxyapatite Nanopowder/Nanoparticles, Needle Type, Purity: 96%, Size: 200 nm
Zinc Ferrite (ZnFe2O4) Micron Powder, Zinc Iron Oxide Micron Powder, -325 mesh, 99.9%
Iron (Fe) Micron Powder, Purity: 99%, Size: 100 mesh
Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: %99.99, Size: 20-30 nm, 167 ppm
Activated Carbon & Carbon Nanotube Mixed
Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm
Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 20 µm
Titanium Silicon Carbide (Ti3SiC2) Micron Powder, Purity: 99.5+%, Size: < 325 mesh
Aligned Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm, Length 9-14 µm
C-NERGY Super P Conductive Carbon Black, 1 bag: 40 g
Titanium Diboride (TiB2) Micron Powder, Purity: 98.5+%, Size: 2.5-13 μm
Zinc Oxide (ZnO) Nanopowder Dispersion in Ethanol, Size: 20-30nm, 20wt%
Magnesium Oxide (MgO) Micron Powder, Purity: 99.99 %, Size: 500 nm – 1500nm
Silver (Ag) Nanopowder/Nanoparticles, Purity: 99.95% , Size: 45-75 nm, w/~0.25% PVP
Silicon Carbide (SiC) Nanopowder/Nanoparticles, Beta, Purity: 99.5+%, Size: 790 nm
Silica (SiO2) Micron Powder, Spherical, APS: 0.3um, SiO2 Content:99.5+%
Terbium Oxide (Tb4O7) Micron Powder, Purity: 99.99%, Size: 325 mesh
Lithium Fluoride Powder, Size: <100 μm, Purity: 99.95 %
Yttrium (Y) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Cerium Oxide (CeO2) Micron Powder, Purity: 99.99%, Size: 325 mesh, White
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Alpha, High Purity: 99.95%, Size: 180 nm, Hydrophilic
C-NERGY SUPER C45 Conductive Carbon Black (set: 80 g)
KETJENBLACK EC-300J Conductive Carbon Black
Silicon (Si) Micron Powder, Purity: 99.99 %, Size: 100 mesh
(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm
Holmium Oxide (Ho2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Alpha/Gamma, Size: 48 nm, 85% Alpha, 15% Gamma
Cobalt (Co) Micron Powder, Purity: 99.9%, Size: 1 µm
Tungsten Disulfide (WS2) Micron Powder, Purity: 99.9%, Size: 1 µm
Lanthanum (La) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Titanium Aluminum Carbide (Ti2AlC) Micron Powder, Purity: 99.9+%, Size: 50 µm
Aluminum Nitride (AlN) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 60-70 nm, Hexagonal
Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 18 nm, Partially Passivated
Hydroxyapatite Nanopowder/Nanoparticles, Purity: 95% min, Size: 50 nm
Antimony Tin Oxide (ATO) Nanopowder/Nanoparticles, Purity: 99.9%, Size: 20-50 nm
Tungsten (W) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 780 nm, metal basis
Chromium (Cr) Micron Powder, Purity: 99.9 %, Size: 15-60 µm, Spherical
Tungsten Carbide Cobalt (WC/Co) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 35-75 nm
Nanoclay, Purity: 99.9%, Size: 800 nm
Boron Nitride (BN) Nanopowder/Nanoparticles, Purity: 99.7%, Size: 790 nm, Hexagonal
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 1-10 μm
Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 45 nm, Cubic
Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-95 nm
Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion, Size: 40-50 nm, 22 wt%
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Neodymium Oxide (Nd2O3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 25-40 nm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Gamma, Purity: 99.995%, Size: 4 nm, Hydrophilic
P25 Titanium Dioxide Nanopowder (TiO2) Purity 99.5+ % Size 20 nm
Lanthanum Oxide (La2O3) Nanopowder/Nanoparticles, Purity: 99.995%, Size: < 180 nm
Erbium Oxide (Er2O3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-90 nm, Cubic
Spherical Nickel Base Alloy Micron Powder, Inconel 625 Powder, Size: 50-150 µm
Spherical Nickel Base Alloy Micron Powder, Inconel 718 Powder, Size: 50-150 µm
Manganese Dioxide (MnO2) Micron Powder, Purity: 99 %, Size: 200 mesh
Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles, Purity: 99.95+ %, Size: 30 nm
Titanium Nitride (TiN) Nanopowder/Nanoparticles, Purity: 99.2+%, Size: 20 nm, Cubic
Titanium Carbide (TiC) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 35-55 nm, Cubic
Tantalum Carbide (TaC) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 950 nm, Cubic
Molybdenum Oxide (MoO3) Nanopowder/Nanoparticles, High Purity: 99.96+%, Size: 8-75 nm
CR2025 Coin Cell Cases (Positive and Negative Cases), Materials: 304SS
Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 8-28 nm
Chromium Oxide (Cr2O3) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 55 nm, Hexagonal
Nickel (II) Hydroxide (Ni(OH)2) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18 nm, Beta
Selenium Dioxide (SeO2) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 0.5 wt%
Zinc Oxide (ZnO) Nanopowder/Nanoparticles Water Dispersion, Size: 25-35 nm, 22 wt%
Boron Carbide (B4C) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 40-60 nm, Hexagonal
Titanium (Ti) Micron Powder, Purity: 99.5+%, Size: 200 mesh
Silicon Carbide (SiC) Nanopowder/Nanoparticles, Beta, Purity: 99.5%, Size: 20 nm, Laser Synthesized
Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55%, Size: 22 nm, Partially Passivated
Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18-38 nm
Nitinol Shape Memory Alloy Wire, Diameter: 2 mm, AF: 80-85°C
KETJENBLACK EC-600JD Conductive Carbon Black
Strontium Titanate (SrTiO3) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 300-500 nm
Iron Oxide (Fe3O4) Nanopowder/Nanoparticles, High Purity: 99.55+%, Size: 14-29 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile:99.5+%, Size: 200 nm
Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles, Purity: 99.75%, Size: 48 nm
Dysprosium Oxide (Dy2O3) Nanopowder/Nanoparticles, High Purity: 99.95+%, Size: 28 nm
Iron Oxide (Fe2O3) Nanopowder/Nanoparticles, Alpha, High Purity: 99.6+%, Size: 28 nm
Iron Oxide (Fe2O3) Nanopowder/Nanoparticles, Gamma, High Purity: 99.55+%, Size: 18 nm
Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm
Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents
Tin Oxide (SnO2) Nanopowder/Nanoparticles, Purity: 99.97%, Size: 430 nm
304 Stainless Steel Wave Spring (Belleville Washers) for CR2032, Diameter: 15.4 mm, Thickness: 0.2 mm, Height: (1.2±0.03) mm
Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles, Purity: 99.77%, Size: 48 nm
(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm
(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 10-30 nm
(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm
Carbon Nanotube (CNT) Nanoribbon Water Dispersion, 0.5 mg/mL
Spherical Nickel Base Alloy Micron Powder, Inconel 625 Powder, Size: 30-60 µm
Calcium Copper Titanate (CaCu3Ti4O12) Nano Powder, D50: 360 nm, Purity: ≥ 99.5 %
Multi Walled Carbon Nanotubes Water Dispersion, 4 wt%, Purity: > 96%, OD: 45-75 nm, Length: 8-18 µm
Multi Walled Carbon Nanotubes, Purity: > 95%, Outside Diameter: 30-50 nm
Zinc Oxide (ZnO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 18 nm, KH550
Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 1”, Thickness: 0.125”
Lithium Carbonate (Battery Grade, Li2CO3) Purity ≥99.5%
Activated Carbon Micron Powder, Size: 200 Mesh
Spherical Nickel Base Alloy Micron Powder, Inconel 718 Powder, Size: 30-60 µm
Iron Nickel (Fe-Ni) Alloy Powder, Purity: 99.9%, Size: 325 mesh, Fe/Ni: 5:5
Tin (Sn) Micron Powder, Purity: 99.9 %, Size: 325 mesh
Graphene NMP Dispersion, Purity: 99.5%, Graphene: 0.5 wt%
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol, Size: 12 nm, Anatase, 22 wt %
Tungsten (W) Micron Powder, Purity: 99.95 %, Size: 2 µm
Spherical Nickel Base Alloy Micron Powder, Inconel 718 Powder, Size: 10-25 µm
Spherical Nickel Base Alloy Micron Powder, Inconel 625 Powder, Size: 15-45 µm
Tungsten Oxide (WO3) Micron Powder, Purity: 99.99%, Size: 3 µm
Lithium Manganese Oxide (LiMn2O4) Powder for Li-ion Battery Cathode Application
Europium Oxide (Eu2O3) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 8-90 nm, Cubic
Lead (Pb) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Gadolinium Oxide (Gd2O3) Micron Powder, Purity: 99.99%, Size: 2-3 μm
Calcium Oxide (CaO) Nanopowder/Nanoparticles, Purity: 99.95+%, Size: 10-70 nm
Nitinol Shape Memory Alloy Wire, Diameter: 1 mm, AF: 15-20°C
Copper Oxide (CuO) Nanopowder/Nanoparticles, High Purity: 99.995%, Size: 15-45 nm
(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm
Tantalum Carbide (TaC) Micron Powder, Purity: 99.9 %, Size: 3 µm
Type 316 Stainless Steel Powder, Purity: 99.9 %, Size: 325 mesh
Nitinol Shape Memory Alloy Wire, Diameter: 1 mm, AF: 45-50°C
Titanium Dioxide (TiO2) Micron Powder, Purity: 99.5+ %, Size: 1 µm, White, Rutile
Calcium Oxide (CaO) Micron Powder, Purity: 99.9 %, Size: 1µm
Spherical Nickel Base Alloy Micron Powder, Inconel 718 Powder, Size: 15-45 µm
Boron Nitride (BN) Nanopowder/Nanoparticles, Purity: 99.85+%, Size: 65-75 nm, Hexagonal
(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm
Silicon (Si) Nanopowder/Nanoparticles, Purity: 97+%, Size: 45-65 nm, Oxygen Content: < 3%
Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles, High Purity: 99.55%, Size: 28-48 nm
Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm
Multi Walled Carbon Nanotubes, Purity: 92%, Outside Diameter: 8-10 nm
(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm
Industrial Grade Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 7-16 nm
Aqueous Suspension of Nanocrystalline Cellulose (NCC), 6%wt
Highly Conductive Expanded Graphite Micron Powder, Purity: ≥ 96%, Size: 20 µm
Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm
Manganese Oxide (Mn2O3) Nanopowder/Nanoparticles, Purity: 99.4%, Size: 28 nm
Silicon (Si) Nanopowder/Nanoparticles, Purity: 99+%, Size : < 70 nm, Laser Synthesized
Aluminum Sulfate Octadecahydrate (Al2H36O30S3), Purity: > 99%
Cadmium Selenide (CdSe) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: <100 nm
Graphite (C) Nanopowder/Nanoparticles, Purity: 99.9 %, Size: < 50 nm
Boron (B) Nanopowder/Nanoparticles , APS:100 nm, Purity:99.55+%
Niobium Carbide (NbC) Micron Powder, Purity: 99.95%, Size: 1-3 µm
Silicon (Si) Nanopowder/Nanoparticles, Purity: 97+%, Size: 35-55 nm, Oxygen Content: < 3%
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Coated with Aluminic Ester, Alpha, Size: 55 nm, Super Hydrophobic, Al2O3: Aluminic Ester=98.1:1.2
Double Walled Carbon Nanotubes, Purity: > 65%
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile Si Oil, Size: 25 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile, High Purity: 99.5+ %, Size: 28 nm
Titanium Carbide (TiC) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 790 nm, Cubic
Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 45 nm
Zirconium Carbide (ZrC) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 400-1100 nm, Cubic
Silicon Carbide (SiC) Micron Powder, Beta, Purity: 99.5+%, Size: < 2,6 µm, Whisker
Zinc Oxide (ZnO) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 18 nm
Nickel Tabs, Width: 3 mm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile Al, Si, Stearic Acid, Size: 25 nm
Indium Tin Oxide (ITO) Nanopowder/Nanoparticles, 90:10, Purity: 99.99%, Size: 18-65 nm
High Capacity and High Purity Graphite Micron Powder for Li-ion Battery
Antimony (Sb) Micron Powder, Purity: 99.99 %, Size: 200 mesh
Manganese Sulfate Monohydrate (MnSO4.H2O), Purity: > 99%
Tungsten (W) Micron Powder, Purity: 99.95%, Size: Sub-Micron
Magnesium (Mg) Micron Powder, Purity: 99.95%, Size: 35 µm, Metal Basis
Expandable Graphite, Purity: 95-97%, Size: 50 mesh
Tungsten (W) Micron Powder, Purity: 99.95 %, Size: 5 µm
Titanium (Ti) Micron Powder, Purity: 99.5+ %, Size: 100 mesh
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99+%, Size: 200 mesh, Fused
Europium (Eu) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Zinc Oxide (ZnO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 30-50 nm
Lithium hydroxide monohydrate (Trace Metals basis, LiOH.H2O), Purity: 99.995%
Molybdenum (Mo) Micron Powder, Purity: 99.99 %, Size: 10 µm
Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 325 mesh
Aligned Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm, Length 25-95 µm
Bismuth Oxide (Bi2O3) Micron Powder, Purity: 99.99%, Size: 1-5 µm
Carbon Nanotubes Doped with 32 wt% Graphene Nanopowder/Nanoparticles
Carbon Black Powder, Purity: 99.99 %, Size: 4 µm
Bismuth Oxide (Bi2O3) Micron Powder, Purity: 99.99%, Size: 10 µm
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99.5+%, Size: 1-2 µm, Fused
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Anatase, Purity: 99.5+ %, Size: 20-30 nm
Graphene Oxide Dispersion, 8 mg/mL, in H2O
Nitinol Shape Memory Alloy Wire, Diameter: 0,5 mm, AF: -10 – -15°C
Cobalt Iron Oxide (CoFe2O4) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 30 nm
Industrial Grade Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-28 nm
304SS Coin Cell Conical Spring for CR2032, Diameter: 15.4 mm, Height: 1.1 mm, Thickness: 0.25 mm
Manganese (II) Carbonate (MnCO3) Nanopowder/Nanoparticles, Purity: 99.5+ %, Size: 50 nm
(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm
(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm
Tungsten (W) Micron Powder, Purity: 99.95%, Size: 10 µm
Conductive Graphite Powder for Lithium Battery, Purity: 99.9+%, Size: 1-5 µm
Cellulose Nanocrystal (Nanocrystalline Cellulose,CNC)
(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm
CNTs-High Impact Polystyrene Resin Matrix, CNTs: 22 wt%, HIPS: 78 wt%
Expandable Graphite, Purity: 99-99.5%, Size: 50 mesh
Aluminum Oxide (Al2O3) Micron Powder, Purity: 99+%, Size: 325 mesh, Fused
Carbon Black & Carbon Nanotube Mixed, Purity: >97.5%
Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm
Carbon Nanotubes-based Conductive Additives for Lithium Ion Battery
Indium Tin Oxide (ITO) Nanopowder/Nanoparticles, 95:5, Purity: 99.97+%, Size: 18-73 nm
Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles, Purity: 99+%, Size: 10-70 nm
Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles, Purity: 99.75+%, Size: 25-125 nm
Zinc Cobalt Iron Oxide (Zn0.5Co0.5Fe2O4) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 38 nm
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Water, Amorphous, Size: 28 nm, 26 wt%
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol, Size: 22 nm, Amorphous, 15 wt%
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in 1, 2-Propanediol, Size: 22 nm, Amorphous, 15 wt%
Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 28-48 nm
Cuprous Oxide (Cu2O) Micron Powder, Purity: 99.9%, Size: 1 µm
Boron (B) Micron Powder, Purity: 99 %, Size: 10 µm, Amorphous
Carbon Nanotube (CNT) Nanoribbon Water Dispersion, 1 mg/mL
Manganese (Mn) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 570 nm, Metal Basis
Copper (Cu) Nanowire, Purity: 99.55%, in Ethanol
Tungsten Disulfide (WS2) Nanopowder/Nanoparticles, Purity: 99.99+%, Size: 35-75 nm
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.85%, Size: 22 nm, Partially Passivated
Zirconium Carbide (ZrC) Nanopowder/Nanoparticles, Purity: 99.5+%, Thickness: 18 nm, Cubic
Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles, Purity: 99.55%, Size: 8 nm
Nickel Tab with Adhesive Polymer Tape as Negative Terminal for Pouch Cell, Width: 4 mm
Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: %99.99, Size: 3 nm, 2200 ppm
Zirconium Hydride (ZrH4) Nanopowder/Nanoparticles, Purity: 99.5+ %, Size: 20-40 nm
(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 1”, Thickness: 0.250”
C-NERGY SUPER C65 Conductive Carbon Black
Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 790 nm, Metal Basis
Carbon Titanium Nitride (TiNC) Micron Powder, Purity: 99.95%, Size: 1.05-3.05 μm
Zirconia-Yttria Nanopowder/Nanoparticles, ZrO2-8Y, Purity: 99.95%, Size: 30 nm
Triton X-100
Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55%, Size: 22 nm, Carbon Coated
Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size:18 nm, Carbon Coated
Silicon Carbide (SiC) Micron Powder, Purity: 98+%, Size: 1-10 μm
Graphite Sheet Thermal Interface Material, EYG Series, 1350 W/m.K, Thickness: 40 µm, Lenght: 115 mm, Width: 90 mm
PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors, Volume:50,100,500 ml
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water, Gamma, Size: 8 nm, 22 wt%
304SS Coin Cell Battery Spacer, Diameter: 15.8 mm, Thickness: 0.5 mm
Polytetrafluoroethylene (PTFE) Condensed Liquid Binder for Li-ion Battery
Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 3 µm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile, High Purity: 99.5+ %, Size: 490 nm
Molybdenum Carbide (Mo2C) Micron Powder, Purity: 99.95%, Size: 2.6 µm, Hexagonal
Zinc Carbonate (ZnCO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 18 nm
Molybdenum (Mo) Micron Powder, Purity: 99.99 %, Size: 1 µm
316 Stainless Steel Wave Spring (Belleville Washers) for CR2032, Diameter: 15.8 mm, Thickness: 0.5 mm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Anatase/Rutile, Purity: 99.5+%, Size: 18 nm
Cobalt Aluminate Blue Spinel Nanopowder CoAl2O4 Size: 300-500 nm
Nickel Foam for Battery Applications Size: 200 mm x 300 mm x 0.5 mm
Indium Hydroxide (In(OH)3) Nanopowder/Nanoparticles, High Purity: 99.996%, Size: 15-65 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Anatase, Purity: 99.5+ %, Size: 17 nm
Graphite Sheet Thermal Interface Material, EYG Series, 1700 W/m.K, Thickness: 25 µm, Lenght: 180 mm, Width: 115 mm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 1, 2-Propanediol, Size: 12 nm, Anatase, 22 wt%
Stellite 6 Spherical Micron Powder, Size : 15-45μm
Graphite Sheet Thermal Interface Material, EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 180 mm, Width: 115 mm
Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 48-78 nm
Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion, Size: 25-45 nm, 42 wt%
Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 18-28 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile, High Purity: 99.5+ %, Size: 45 nm
Silicon Carbide (SiC) Micron Powder, Beta, Purity: 99.5+%, Size: 1.5-35 µm, D50
Erbium (Er) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Cerium Oxide (CeO2) Nanopowder/Nanoparticles, Purity: 99.975%, Size: 8-28 nm
(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm
(-OH) Functionalized Single Walled Carbon Nanotubes, Purity: > 65%
Nickel Hydroxide Ni(OH)2 (NiOH-Co) Micron Powder, Size: 10-15 µm, Spherical
Magnesium Oxide (MgO) Nanopowder/Nanoparticles Ethanol Dispersion, Size: 45 nm, 22 wt%
Nitinol Shape Memory Alloy Wire, Diameter: 1,5 mm, AF: 35-40°C
Terbium (Tb) Micron Powder, Purity: 99.5 %, Size: 325 mesh
(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm
Carbon Nanotubes Doped with 52 wt% Boron Nitride (BN) Nanopowder/Nanoparticles
(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm
(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm
(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm
(-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 8-18 nm
(-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 4-16 nm
Lithium Nickel Manganese Cobalt Oxide (LiNiCoMnO2) Powder for High Power Li-ion Battery Cathode Application, (Ni:Mn:Co=5:3:2) NMC 532
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 80-240 nm, Metal Basis
(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm
Graphite Fluoride (Carbon Monofluoride) Micron Powder, 10-20 micron, F/C Ratio : 1.0
Silicon Nitride (Si3N4) Nanopowder/Nanoparticles, Beta, Purity: 99.6%, Size: 760 nm
(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm
(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm
Nickel Cobalt Iron Oxide (Ni0.5Co0.5Fe2O4) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 35 nm
Tin (Sn) Nanopowder/Nanoparticles, Purity: 99.9+%, Size: 50-70 nm, Metal Basis
Zinc (Zn) Nanopowder/Nanoparticles, High purity: 99.995+%, Size: 90-110 nm
(-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 18-28 nm
Spherical TC4 Titanium Based Micron Powder for 3d Printers, Ti6Al4V, 50-150 µm, Spherical
Graphite Sheet Thermal Interface Material, EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 115 mm, Width: 90 mm
Spherical Nickel Base Alloy Micron Powder, Inconel 625 Powder, Size: 10-25 µm
Carbon Nanotubes Doped with 52 wt% Graphene Nanopowder/Nanoparticles
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Zinc Manganese Iron Oxide (Zn0.5Mn0.5Fe2O4) Nanopowder/Nanoparticles, Purity: 99.995%, Size:28-58 nm
Carboxymethyl Cellulose (CMC) Micron Powder for Li-ion Battery Anode Materials
(-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 48-78 nm
Carbon Nanotubes Thermal Radiation Coating Dispersion
(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-28 nm
High Temperature Polyimide Tape for Lithium Battery, Width: 10 mm
(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-15 nm
(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 48-78 nm
(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm
(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 18-38 nm
Reduced Graphene Oxide (rGO),Purity: 99%, S.A: 15.62 m2/g, 2-5 layers
Graphene Ethanol Dispersion, Purity: 99.5%, Graphene: 0.5 wt%
Tungsten Oxide (WO3) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 20-60 nm, Orthorhombic
Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 65 nm, Metal Basis
Titanium Nitride (TiN) Nanopowder/Nanoparticles, Purity: 99.3+%, Size: 790 nm, Cubic
(-COOH) Functionalized Single Walled Carbon Nanotubes, Purity: > 65%
Silicon Monoxide (SiO) Pellets, Purity: 99.99%, Size: 1-3 mm
Erbium Oxide (Er2O3) Micron Powder, Purity: 99.99%, Size: 1-10 µm
Zinc Titanate Micron Powder (ZnTiO3) Purity: 99+%, Size: 1-2 µm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Anatase, High Purity: 99.5+ %, Size: 10-20 nm
Conductive Carbon Black Nanopowder/Nanoparticles, Size: 30 nm
(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 8-18 nm
Aluminum (Al) Micron Powder, Purity: 99.99 %, Size: 325 mesh
(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm
Zirconium Diboride (ZrB2) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 45 nm, Hexagonal
Praseodymium Oxide (Pr6O11) Micron Powder, Purity: 99.99%, Size: 325 mesh
Carbon Aluminum Nitride (AlNC) Micron Powder, Purity: 99.95%, Size: 1-3 µm
(-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 28-48 nm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water, Gamma, Size: 28 nm, 22 wt%
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Water, Amorphous, Size: 8-33 nm, 26 wt%
Zinc (Zn) Nanopowder/Nanoparticles, High purity: 99.9+%, Size: 60-70 nm
CR2025 Coin Cell Cases (Positive and Negative Cases), Materials: 316SS
Spherical TC4 Titanium Based Micron Powder for 3d Printers, Ti6Al4V, 25-50 µm, Spherical
Iron (II,III) Oxide (Fe3O4) Nanopowder/Nanoparticles Water Dispersion, Size: 13-18 nm, 22 wt%
Lithium Zirconate (Lithium Zirconium Oxide, Li2ZrO3), Purity: ≥99, Size: 1 -3 µm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 25-45 nm, 42 wt%
316SS Coin Cell Battery Spacer, Diameter: 15.8 mm, Thickness: 0.5 mm
Graphite Fluoride (Carbon Monofluoride) Micron Powder for Li-ion Battery, 10-20 micron, F/C Ratio : 0.8-1.0
Thulium Oxide (Tm2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 1, 2-Propanediol, Size: 12 nm, Gamma, 18 wt%
Lithium Iron Phosphate (LiFePO4) Powder for Li-ion Battery Cathode Application
Indium Oxide (In2O3) Nanopowder/Nanoparticles, High Purity: 99.9%, Size: 18-68 nm
Cobalt (Co) Micron Powder, Purity: 99.9%, Size: 325 mesh
(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 90%, Outside Diameter: 50-80 nm
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol, Size: 12 nm, Gamma, 18 wt%
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 3-28 nm, 16 wt%
Silicon (Si) Micron Powder, Purity: 99.99 %, Size: 1 µm
Short Single Walled Carbon Nanotubes, Purity: > 65%, SSA: 400 m2/g
Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55+%, Size: 60-70 nm, Metal Basis
Lanthanum Trifluoride (LaF3) Nanopowder/Nanoparticles, Highly Dispersible, Purity: 99+%, Size: 30-50 nm
Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 48-78 nm
Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55+%, Size: 90-100 nm, Metal Basis
Industrial Grade Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 48-78 nm
(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 4-16 nm
Silicon Nitride (Si3N4) Nanopowder/Nanoparticles, Amorphous, Purity: 99.5%, Size: 20-35 nm
Erbium Oxide (Er2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Silicon Carbide (SiC) Nanopowder/Nanoparticles, Beta, Purity: 99.5+%, Size: < 70 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Rutile, Size: 4-28 nm, 17 wt%
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Rutile, Size: 25-45 nm, 22 wt%
Cellulose Nanofiber (Cellulose Nanofibril, Nanofibrillated Cellulose, CNFs)
Conductive Carbon Black Nanopowder/Nanoparticles, Size: 20 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Anatase, Size: ≤10nm
316SS Coin Cell Conical Spring for CR2032, Diameter: 15.4 mm, Height: 1.2 mm, Thickness: 0.25 mm
Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.9+%, Size: 110 nm, Metal Basis
Dysprosium Oxide (Dy2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Neodymium Oxide (Nd2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Manganese (II) Acetate Tetrahydrate (C4H16MnO8), Purity: > 99%
(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 18-28 nm
Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 28-48 nm
Ytterbium (Yb) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Aluminum (Al) Nanopowder/Nanoparticles, Purity: ≥99.9%, Size: 68 nm, Metal Basis
Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 14 nm, 1200 ppm
(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 28-48 nm
Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 1,0 wt%
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99 %, Outside Diameter: 48-78 nm
Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material, LiNi0.5Mn1.5O4
Zirconium Nitride (ZrN) Micron Powder, Purity: 99.97%, Thickness: 3.5 μm, Cubic
Cadmium Sulfide (CdS) Nanopowder/Nanoparticles, Purity: 99.9+%, Size: 20 nm
Dummy CZ-Si Wafer, Size: 8”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 1000 (ohm.cm), 1-Side Polished, Thickness: 725 ± 50 μm
Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 16 nm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Rutile, Size: 3-13 nm, 16 wt%
Aluminum Chloride Hexahydrate (AlCl3H12O6), Purity: > 97%
Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 4-16 nm
Spherical TC4 Titanium Based Micron Powder for 3d Printers, Ti6Al4V, 15-35 µm, Spherical
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Water Dispersion, Gamma, Size: 100-200 nm, 23wt%
Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles, Purity: 99.97%, Size: 8-110 nm, Cubic
Conductive Acetylene Black for Li-ion Battery Anode/Cathode
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
ZK60 Magnesium Alloy Micron Powder, Size Range: 20-63 µm, Spherical
High Temperature Teflon Tape for Lithium Battery, Width: 19 mm, Thickness: 0.13 mm, Length: 10 m
Graphene NMP Dispersion, Purity: 99.5%, Graphene: 1,0 wt%
(-OH) Functionalized Double Walled Carbon Nanotubes, Purity: > 65%
Graphene Ethanol Dispersion, Purity: 99.5%, Graphene: 1 wt%
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Graphene Sheet, Size: 29 cm x 29 cm, Thickness: 35 µm, Highly Conductive
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Manganese (Mn) Micron Powder, Purity: 99.99 %, Size: 100 mesh
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Lithium (Li) Foil Thickness:0.5 mm, Width: 50 mm, Length: 100 mm, Purity: 99.9%
Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles, Purity: 99.7+%, Size: 25 nm
Silver (Ag) Nanopowder/Nanoparticles Water Dispersion, Size: 2 nm, Colorless & Transparent, 2.200 ppm
Water.webp
Water Soluble Carbon Quantum Dots 590-620 nm
Boron (B) Micron Powder, Purity: 95+%, Size: 1-2 μm Amorphous
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Titanium (Ti) Micron Powder, Purity:99.5+%, Size:75-150 µm, Spherical
G-QD.webp
Graphene Quantum Dots (1mg/ml) (GQD)
Barium Iron Oxide (BaFe12O19) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 55 nm
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Hafnium Oxide (HfO2) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 18-28 nm
(-COOH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm
Titanium Alloy Micron Powders, CPTi, 50-150 µm, Spherical
Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm
Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles, Size: < 80 nm
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm
Zirconium Diboride (ZrB2) Micron Powder, Purity: 99.5%, Size: 5.5 μm, Hexagonal
Nickel (Ni) Micron Powder, Purity: 99.95 %, Size: 4 µm, Spherical
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 2”, Thickness: 0.125”
Cadmium Sulfide (CdS) Nanopowder/Nanoparticles, Purity: 99.95+%, Size: 5 nm
Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
High Purity Natural Graphite Nanopowder/Nanoparticles for Li-ion Battery, Purity: 99.99+%, Size: 30 nm
Carbon Nanotube (CNT) Nanoribbon Water Dispersion, 2 mg/mL
Iron (Fe) Micron Powder, Purity: 99.99 %, Size: 5 µm
Spherical TC4 Titanium Based Micron Powder for 3d Printers, Ti6Al4V, 10-25 µm, Spherical
Copper (Cu) Micron Powder, Purity: 99.99 %, Size: 1 µm, Spherical
Industrial Grade Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm
Titanium Alloy Micron Powders, CPTi, 25-50 µm, Spherical
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 25-45 nm, 16 wt%
Aluminum chloride (AlCl3) Purity: > 99%
Cuprous Oxide (Cu2O) Micron Powder, Purity: 99.99 %, Size: 3 µm
Vanadium Carbide (VC) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 550-750 nm, Cubic
Lead (Pb) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Multi Walled Carbon Nanotubes Water Dispersion, 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-35 µm
Boron (B) Micron Powder, Purity: 95+ %, Size: -325 mesh, Amorphous
Lithium Nickel Manganese Cobalt Oxide (LiNiMnCoC) Powder (NMC 622)
Lithium Nickel Manganese Cobalt Oxide Powder (NMC 811)
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Aluminum Foam for Battery and Supercapacitor Research, Purity: 99+%, Size : 100 mm x100 mm x 4mm
Titanium Alloy Micron Powders, CPTi, 15-35 µm, Spherical
Lithium Nickel Manganese Cobalt Oxide (LiNiMnCoC) Powder (NMC 111)
Nickel (III) Oxide (Ni2O3) Nanopowder/Nanoparticles, Purity: 99.95+ %, Size: 40 nm
(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm
Tungsten (W) Micron Powder, Purity: 99.95%, Size: 325 mesh
Highly Conductive Expanded Graphite Micron Powder, Purity: ≥ 96%, Size: 70 µm
Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 8-18 nm
Manganese (II) Chloride (MnCl₂), Purity: > 99%
Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Helical Multi Walled Carbon Nanotubes, Outside Diameter: 75-175 nm, Length: 2-15 µm
Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 4-16 nm
Tungsten (W) Nanopowder/Nanoparticles, Purity: 99.955+%, Size: 65 nm, Metal Basis
Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion, 4 wt%, Purity: > 96 %, OD: 18-28 nm, Length 8-18 µm
Iron (III) Chloride (FeCl3), Purity: > 99%
Carbon Nanotubes Metal Tapes with Iron (Fe) 14 wt%, Thickness: 18 µm, Dia: 47 mm
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.85%, Size: 22 nm, Carbon Coated
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Graphene Oxide, 2-5 Layer, Dia: 4,5 µm, SA: 420 m2/gr
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Copper Oxide (CuO) Nanopowder/Nanoparticles Water Dispersion, Size: 20-50 nm, 22 wt%
Zinc Sulfide (ZnS) Pellets, Purity: 99.99%, Size: 1-10 mm
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 3-12 nm, 16 wt%
(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 7-16 nm
Graphitic Carbon Nitride (g-C3N4) Powder 1-10 μm
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 3” , Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Carbon Nanotube-Mica Prepared by Electrostatic Adsorption, CNTs: 15 wt%; Mica: 85 wt%
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Silver Tin (Ag-Sn) Alloy Nanopowder/Nanoparticles, Purity: 99.95%, Size : < 110 nm
Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption, CNTs: 15 wt%, TiO2-rutile: 85 wt%
Copper Foam for Battery and Supercapacitor Research, Purity: 99.9+%, Size : 100 mm x100 mm x 1mm
Cobalt (Co) Micron Powder, Purity: 99.9%, Size: 100 mesh
Graphene Ethanol Dispersion, Purity: 99.5%, Graphene: 2 wt%
Cobalt Titanate Green Spinel Nanopowder ( Co2TiO4)
Titanium Oxynitride Nanoparticle, APS: 20 nm, Purity: 99.9%
Europium Oxide (Eu2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Lithium Nickel Cobalt Aluminum Oxide (NCA) (LiNi0.8Co0.15Al0.05O2) Powder for High Power Li-ion Battery Cathode Application
Silicon Carbide (SiC) Nanopowder/Nanoparticles, Beta, Purity: 99.5+%, Size: 50-70 nm
Silver Copper (Ag-Cu) Alloy Nanopowder/Nanoparticles, Purity: 99.95% , Size: < 110 nm
Tungsten Carbide (WC) Nanopowder/Nanoparticles, Purity: 99.96%, Size: 25-95 nm
Iron Foam for Battery and Supercapacitor Research, Purity:98%, Size:300*200mm, Thickness: 2mm
PVDF Binder for Li-ion Battery Electrodes (set: 80g )
Zinc (Zn) Micron Powder, Purity: 99.9%, Size: 10 µm
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Lead Oxide (PbO) Micron Powder, Purity: 99.99 %, Size: 325 mesh, Yellow
Multi Walled Carbon Nanotubes Water Dispersion, 4 wt%, Purity: > 96%, OD: 3-13 nm, Length: 45 µm
Graphite Sheet Thermal Interface Material, EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 180 mm, Width: 115 mm
Titanium Alloy Micron Powders, CPTi, 10-25 µm, Spherical
Tungsten Oxide (WO3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Carbon Nanotubes Doped with 52 wt% Copper (Cu) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 52 wt% Tin (Sn) Nanopowder/Nanoparticles
Titanium Aluminum Carbide (Ti2AlC) MAX Phase Micron Powder, APS: 325 Mesh, Purity: 99+ %
Titanium (Ti) Micron Powder, Purity:99.5+%, Size:15-53 µm, Spherical
Super Conductive Carbon Black Nanopowder and Carbon Nanotube Mixed
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Graphitized Carbon Nanofiber, Purity: 99.95%, Size: 200-600 nm
Cesium Tungsten Oxide (Cs0.33WO3) Nanopowder/Nanoparticles, Purity: 99+%, Size: 18 nm
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 80 nm
Tantalum Pentoxide (Ta2O5) Micron Powder, Purity: 99.9 %, Size: 3 µm, White
Titanium (Ti) Micron Powder, Purity:99.5+%, Size:5-25 µm, Spherical
SS316 Coin Cell Battery Spacer, Diameter: 15.8mm, Thickness: 1mm
Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Carbon Nanotubes Doped with 52 wt% Silica (SiO2) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 52 wt% Iron Oxide (Fe3O4) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 52 wt% Zinc (Zn) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 52 wt% Titanium (Ti) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 52 wt% Cobalt (Co) Nanopowder/Nanoparticles
Gold (Au) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 20-30 nm, 172 ppm
Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Chromium Nitride (CrN) Micron Powder, Purity: 99.99%, Size: 1-3 µm
Tantalum (Ta) Micron Powder, Purity: 99.9 %, Size: 325 mesh
Cobalt Oxide (CoO) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Graphite Sheet Thermal Interface Material, EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 230 mm, Width: 180 mm
Boron (B) Micron Powder, Purity: 95+%, Size: < 1 µm, Amorphous
(-COOH) Functionalized Short Single Walled Carbon Nanotubes, Purity: > 65%
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.250”
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Single Walled Carbon Nanotubes, Purity: > 92%, OD: 1-2 nm
Nickel Oxide (NiO) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18 nm, Cubic
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Titanium Dioxide (TiO2) Dispersion in PGMEA or PGME, Size: 1 µm, Rutile, 20 wt%
Carbon Nanotubes Doped with 52 wt% Alumina (Al2O3) Nanopowder/Nanoparticles
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles, Rutile: 90 wt%, CNTs: 8 wt%
Lithium (Li) Foil Thickness:0.6 mm, Width: 25 mm, Length: 100 mm, Purity: 99.9%
Carbon Nanotubes Doped with 52 wt% Aluminum (Al) Nanopowder/Nanoparticles
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Titanium Aluminum Carbide (Ti3AlC2) MAX Phase Micron Powder, APS: 325 Mesh, Purity: 99+ %
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Nitrogen-doped Multi Walled Carbon Nanotubes
Nickel Chromium (Ni-Cr) Alloy Nanopowder/Nanoparticles, Purity: 99.95%, Size: < 90 nm
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 2 wt%
Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.95+%, Size: 200 mesh
Tantalum (Ta) Micron Powder, Purity: 99.9 %, Size: 100 mesh
Nickel (Ni) Micron Powder Type 255, Purity: >99.7 %, APS: 2.2–2.8 μm
Carbon Nanotubes Doped with 12 wt% Iron (Fe) Nanopowder/Nanoparticles
Beryllium (Be) Micron Powder, Purity: 99.5+%, Size: -100 mesh
Magnesium Nitride (Mg3N2) Micron Powder, Purity: 99.95%, Size: 35 µm
Tin Oxide (SnO2) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18 nm
Hafnium Carbide (HfC) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 790 nm, Cubic
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Carbon Nanotubes Doped with 32 wt% Silicon (Si) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 32 wt% Copper (Cu) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 32 wt% Iron (Fe) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 12 wt% Copper (Cu) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 52 wt% Silicon (Si) Nanopowder/Nanoparticles
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 2” , Thickness: 0.250”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Niobium (Nb) Micron Powder, Purity: 99.95 %, Size: 3 µm
Cadmium Selenide (CdSe) Micron Powder, Purity: 99.9+%, Size: 1-10 µm
Carbon Nanotubes Doped with 52 wt% Iron (Fe) Nanopowder/Nanoparticles
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.125”
Carbon Nanotubes Doped with 32 wt% Silicon (Si) and 32 wt% Graphene Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 12 wt% Aluminum (Al) Nanopowder/Nanoparticles
Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 1”, Thickness: 0.125”
Graphene NMP Dispersion, Purity: 99.5%, Graphene: 2,0 wt%
Carbon Nanotubes Doped with 32 wt% Aluminum (Al) Nanopowder/Nanoparticles
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 1”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Aluminum Zirconium Alloy Powder, Purity: 99.9+%, Size: < 44 µm, Al: 90%, Zr: 10%
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
SS304 Coin Cell Battery Spacer, Diameter: 15.8mm, Thickness: 1mm
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.250”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Silicon (Si) Nanopowder for Battery Applications
Yttrium Oxyfluoride (YOF) Nanopowder, Purity: 99.9%, APS: < 50 nm
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Yttrium Fluoride (YF3) Nanopowder, Purity: 99.9%, APS: < 50 nm
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size:1”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
(-OH) Functionalized Single Walled Carbon Nanotubes, Purity: > 92%, SSA: 370 m2/g, Dia: 1.0 nm
(-COOH) Functionalized Single Walled Carbon Nanotubes, Purity: > 92%, SSA: 370 m2/g
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
PPL Inside Chamber for Hydrothermal Synthesis Autoclave Reactors
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Water-_21_.webp
Diamond (C) Nanopowder/Nanoparticles, Purity: 99%, Size: 30-50 nm
Lanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.5+%, Size: 1.5-18 µm
Crystalline Boron (B) Micron Powder, Average Particle Size: -325 Mesh, Purity: 99+%
Aluminum 2024 Alloy Powder, Size: – 325 mesh
Aluminum 6061 Alloy Powder, Size: 15-53 µm, Spherical
N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials, Purity: 99.90%
Carbon Nanotube-Polystyrene Microspheres Prepared by Electrostatic Adsorption, CNTs: 25 wt%; Polystyrene Microspheres: 75 wt%
Niobium (Nb) Micron Powder, Purity: 99.95%, Size: 325 mesh
Copper (Cu) Micron Powder, Purity: 99.99 %, Size: 100 mesh, Spherical
Hafnium (Hf) Micron Powder, Purity: 99.9 %, Size: 325 mesh
View Product
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 2-Propanol, Size: 12 nm, Anatase, 22 wt%
Cobalt Chromium (Co-Cr) Alloy Powder, Size: < 44 µm, Co: 20%, Cr: 80%
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Ni-Ti50 Alloy Powder / Solid Spherical Micron Powder, Purity: 99.9%, APS: 45-105 μm
WE43 Magnesium Alloy Average Particle Size: 15-53 um, Spherical
Zirconium (Zr) Micron Powder, Purity: 99.9 %, Size: 325 mesh
Crystalline Boron (B) Micron Powder, Average Particle Size: 5 µm, Purity: 99+%
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Lithium Lanthanum Tantalum Zirconate (LLZTO), Size: 1-3 µm, Purity: ≥99.5
Graphite Sheet Thermal Interface Material, EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 230 mm, Width: 180 mm
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 31 nm, Metal Basis
Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 90 nm, Metal Basis
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Carbon Nanotubes Doped with 52 wt% Silver (Ag) Nanopowder/Nanoparticles
Carbon Nanotubes Doped with 12 wt% Silver (Ag) Nanopowder/Nanoparticles
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.125”
Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm
Aluminum Nitride (AlN) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 790 nm, Hexagonal
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption, CNTs: 25 wt%, TiO2-rutile: 75 wt%
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Carbon Nanotubes Doped with 32 wt% Silver (Ag) Nanopowder/Nanoparticles
Molybdenum (Mo) Nanopowder/Nanoparticles, Purity: 99.9%, Size: 50-150 nm, Metal Basis
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 1”, Thickness: 0.125”
Lead Zirconate Titanate (PZT) Nanopowder/Nanoparticles, Purity: 99.5+ %, Size: < 100 nm
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.250”
Crystalline Boron (B) Micron Powder, Average Particle Size: 1 µm, Purity: 99+%
Prime CZ-Si Wafer, Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 279 ± 20 μm
Scandium (Sc) Micron Powder, Purity: 99.9 %, Particle Size: 200 mesh
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Vanadium Aluminum Carbide (V2AlC) MAX Phase Micron Powder, APS: 325 Mesh, Purity: 99+ %
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 1”, Thickness: 0.250”
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 1”, Thickness: 0.250”
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 65 nm, Metal Basis
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Amino-Multi Walled Carbon Nanotubes, Purity: > 95 wt%, Length: 60 μm
Carbon Nanotube Sponges, Size: 10 mm x 10 mm, Thickness: 1-2 mm
Scandium (Sc) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Carbon Nanotubes Metal Films with Iron (Fe) 13 wt%, Thickness: 18 µm, Diameter: 47 mm
Titanium Tin Carbide (Ti2SnC) MAX Phase Micron Powder, APS: 325 Mesh, Purity: 99+ %
Niobium Aluminum Carbide (Nb2AlC) MAX Phase Micron Powder, APS: 325 Mesh, Purity: 99+ %
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Bismuth (III) Sulfide (Bi2S3) Nanopowder/Nanoparticles, Purity: 99.9+%, Size: 500 nm
Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 50 ml
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Indium Oxide (In2O3) Micron Powder, Purity: 99.99 %, Size: 325 mesh, White
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Prime CZ-Si Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 625±25um
Prime CZ-Si Wafer, Size: 2”, Orientation: (111), Boron Doped, Resistivity: 1-20 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 2”, Thickness: 0.250”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.995%, Size: 1”, Thickness: 0.250”
Titanium Foam for Battery and Supercapacitor Research, Purity: 99+%, Size: 100 mm x100 mm x 2.8mm
Carbon Nanotube Sponges, Size: 10 mm x 10 mm, Thickness: 3-4 mm
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Styrene-Butadiene Rubber (SBR) Binder for Li-ion Battery Anode Materials
Carbon Nanotube-Carbon Black Prepared by Electrostatic Adsorption, CNTs: 34.4 wt%, Carbon Black: 65.6 wt%
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Cubic Boron Nitride Nanopowder, Cubic, Size: <250 nm Purity: 99.5%
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Prime CZ-Si Wafer, Size: 2”, Orientation: (111), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 280 ± 15 μm
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Borosilicate Wafer, Size: 3”, 2-Side polished, Thickness: 500 ± 25 μm
Carbon Nanotube Buckypaper with Metal 0.8%, Thickness: 28 µm, Diameter: 35-39 mm
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Copper-Zinc Alloy Nanopowder, Cu55Zn45, Average Particle Size: 50nm, Purity: 99.9%
Lithium Battery Strapping Tape, Width: 10 mm, Thickness: 0.03 mm, Length: 100 m
Iron-Silicon Nanoparticles, Fe65Si35, APS:50nm, Purity: 99.9%
Iron-Nickel Nanoparticles, Fe65Ni35, APS: 50nm, Purity: 99.9%
Copper Nickel Alloy Nanopowder, Cu55Ni45, APS: 50nm, Purity: 99.9%
Aluminum-Silicon (AlSi) Alloy Powder, Al85Si15, APS: 50nm, Purity: 99.9%
Silver Indium (Ag-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9%, Size: 40-100 nm
Vanadium Nitrade (VN) Nanopowder, APS: 40nm, Purity: 99.9%
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Dummy CZ-Si Wafer, Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1-50 (ohm.cm), 2-Side Polished, Thickness: 525 ± 25 μm
Prime CZ-Si Wafer, Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 280 ± 25 μm
Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm
Prime CZ-Si Wafer, Size: 2”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm
Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm
CR2032 Coin Cell Cases with 304SS, Diameter: 20 mm, Height: 3.2 mm
Prime CZ-Si Wafer, Size: 2”, Orientation: (111), Arsenic Doped, Resistivity: 0,001-,0.005 (ohm.cm), 1-Side Polished, Thickness: 400 ± 25 μm
Cobalt (II) Chloride Hexahydrate (Cl2CoH12O6), Purity: > 99%
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 2”, Thickness: 0.125”
Prime CZ-Si Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm
Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 770 nm, Metal Basis
Aluminum Tab for Pouch Li-ion Cell, Width: 4 mm, Length: 57 mm
Quartz Wafer, (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm
Prime CZ-Si Wafer, Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm
Test CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-20 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm
Borosilicate Wafer, Size: 3”, 1-Side polished, Thickness: 150 ± 25 μm
Dummy CZ-Si Wafer, Size: 3”, Orientation: (111), Phosphor Doped, Resistivity: 0,001-100 (ohm.cm), 1-Side Polished, Thickness: 340 ± 25 μm
Prime CZ-Si Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 380±25um
Borosilicate Wafer, Size: 4”, 1-Side polished, Thickness: 700 ± 25 μm
Carbon Nanotubes Highly Conductive Tapes with Metal 8%, Thickness: 18 µm, Dia: 47 mm
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Carbon Nanotubes Doped with 12 wt% Silicon (Si) Nanopowder/Nanoparticles
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Platinum (Pt) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 10 nm, 1100 ppm
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
CR2032 Coin Cell Case (Negative Case, Cone Spring, Spacer, Positive Case)
Thulium (III) oxide Micron Powder, Size: 3-5 um, Purity: 99.9 %
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Cubic Boron Nitride Nanopowder, Cubic, Size: <200 nm Purity: 99.9%
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 80 nm, Metal Basis
Graphene Oxide Water Dispersion, Purity: 99.5%, Black Liquid, GO: 2,0 wt%
Reduced Graphene Oxide Water Dispersion, Purity: 99.5%, rGO: 2,0 wt%
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Prime CZ-Si Wafer, Size: 3”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 625±25um
Short Single Walled Carbon Nanotubes, Purity: > 92%
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2”, Thickness: 0.125”
Prime CZ-Si Wafer, Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Graphite Fluoride (Carbon Monofluoride) Micron Powder, 8-10 micron, F/C Ratio : 1.2
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”
Tantalum (Ta) Nanopowder/Nanoparticles, High Purity: 99.9%, Size: 45-75 nm
Large Surface Area Single Walled Carbon Nanotubes, Purity: > 95%, SSA: 400 m2/g
Prime Si+SiO2 Wafer (dry), Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm, Coating 100 nm
(-OH) Functionalized Short Length Double Walled Carbon Nanotubes, Purity: > 65%
Lithium Lanthanum Zirconate (LLZO, Li7La3Zr2O12), Purity: ≥99.5, Size: 0.3 -1 µm
Prime CZ-Si Wafer, Size: 4”, Orientation: (110), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 525 ± 25 μm
Dummy CZ-Si Wafer, Size: 6”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 100 (ohm.cm), 1-Side Polished, Thickness: 650 ± 50 μm
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Dummy CZ-Si Wafer, Size: 6”, Orientation: (100), Phosphor Doped, Resistivity: 0.001 – 100 (ohm.cm), 1-Side Polished, Thickness: 650 ± 50 μm
Borosilicate Wafer, Size: 4”, 1-Side polished, Thickness: 1000 ± 20 μm
Platinum Oxide (PtO2) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: <100 nm
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, Purity: 99.99% Size: 3”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.250”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 35 nm, Metal Basis
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2”, Thickness: 0.250”
Single Layer Graphene Oxide, Purity: 99.5 %
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2”, Thickness: 0.125”
(-COOH) Functionalized Short Length Double Walled Carbon Nanotubes, Purity: > 65%
Antimony (Sb) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
CR2016 Coin Cell Cases with 304SS (Positive+Negative Cases), Diameter: 20 mm, Height : 1.6 mm
CR2325 Coin Cell Cases with 304SS (Positive+Negative Cases), Diameter: 23 mm, Height : 2.5 mm
Tin (Sn) Micron Powder, Purity: 99.95 %, Size: 3 µm
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.125”
Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.125”
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Prime FZ-Si Wafer, Size: 2”, Orientation: (100), Phosphor Doped, Resistivity: 7000 – 8000 (ohm.cm), 2-Side Polished, Thickness: 250 ± 15 μm
Prime CZ-Si Wafer, Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 2000 ± 50 μm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 8-12 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm
Prime Si+SiO2 Wafer (wet), Size: 2”, Orientation: (111), Boron Doped, Resistivity: 1 -20 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm, Coating 500 nm
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 50 ml
Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55+%, Size: 30-40 nm, Metal Basis
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
(-OH) Functionalized Short Single Walled Carbon Nanotubes, Purity: >92%
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.250”
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 350± 25 μm, Single Side Polished, EPI-ready, Mobility: 1000-3000
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready, Dopant: Zinc (P Type)
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Scandium Oxide (Sc2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Prime CZ-Si Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 0,01-0,02 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm
Prime Si+SiO2 Wafer (wet), Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 380 ± 25 μm, Coating 300 nm
Prime Si+SiO2 Wafer (dry), Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 380 ± 25 μm, Coating 100 nm
Test CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0,001-0,005 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm
Dummy CZ-Si Wafer, Size: 6”, Orientation: (100), Boron Doped, Resistivity: 5-10 (ohm.cm), 1-Side Polished, Thickness: 675 ± 25 μm
Iron (II) Sulfate (FeSO4.xH2O), Purity: > 98%
CR2450 Coin Cell Cases with 304SS (Positive+Negative Cases), Diameter: 24 mm, Height : 5 mm
Aluminum 7075 Alloy Powder, Size: 15-53 µm, Spherical
Silver Conductive Adhesive Paste
Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 100 ml
Magnetic Graphene Aerogel, Content of Fe3O4: 65%, Diameter: 1±0.1 cm
Impending Self-Help Transfer Nickel Graphene Foam, Thickness: 1±0.1 mm, Size: 1×1 cm
Magnetic Graphene Aerogel, Content of Fe3O4: 50%, Diameter: 1±0.1 cm
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 0.005 (ohm.cm), 2- Polished, Thickness: 200 ± 10 μm
Borosilicate Wafer, Size: 4”, 2-Side polished, Thickness: 700 ± 20 μm
Hafnium (Hf) Micron Powder, Purity: 99.9+%, Size: 15-53 μm, Spherical
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2- Polished, Thickness: 200 ± 10 μm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0,01-0,02 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 300 ± 25 μm
Graphitized Carbon Nanofibers, Purity: > 99.9%, Outside Diameter: 50-100 nm, Length: 1-15 μm
Borosilicate Wafer, Size: 4”, 2-Side polished, Thickness: 500 ± 25 μm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: NG08SW0227 400±25um
CR2032 Coin Cell Case (Negative Case, Cone Spring, Spacer, Positive Case), Materials: 316SS
Carbon Nanotube (CNT) Nanoribbon
Ultralight Graphene Aerogel, Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm
Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil
Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Silicon Hexaboride (SiB6) Nanopowder, APS: 40nm, Purity: 99%
Carbon-Coated Aluminum Foil
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Strong Graphene Aerogel, Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm
Carbon Nanotubes(CNT) Modified Graphene Aerogel, Diameter: 1.2±0.1cm, Height: 1.2±0.1cm
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2”, Thickness: 0.125”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3”, Thickness: 0.250”
Prime Si+SiO2 Wafer (wet), Size: 3”, Orientation: (111), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 381 ± 25 μm, Coating 500 nm
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2”, Thickness: 0.250”
Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 100 ml
Nickel Foam for Battery Cathode Substrate, Size: 1000 mm x 300 mm x 1.6 mm
Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Large Inner Diameter Thin Multi-Wall Carbon Nanotubes, Purity: > 92%, OD: 28-58 nm, ID: 18-48 nm
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.250”
Prime Si+SiO2 Wafer (dry), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 200 nm
Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm
Prime CZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 0.05 – 0.152 (ohm.cm), 2-Side Polished, Thickness: 365 ± 15 μm
Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 300 nm
Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm
Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery
Fused Silica Wafer, Size: 4”, 2-Side Polished, Thickness: 1000 ± 25 μm
Fused Silica Wafer, Size: 10mm x 20mm, 2-Side Polished, Thickness: 500 ± 00 μm,
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3”, Thickness: 0.125”
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
(-COOH) Functionalized Short Length Single Walled Carbon Nanotubes, Purity: > 92%
CR2032 Coin Cell Cases with 316SS, Diameter: 20 mm, Height: 3.2 mm
Prime CZ-Si Wafer, Size: 6”, Orientation: (111), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 625±25um
Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 14 nm, 52000 ppm
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 5”, Thickness: 0.250”
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Short Length Double Walled Carbon Nanotubes, Purity: > 65%
Single Walled Carbon Nanotubes, Purity: > 96%, Dia: 1.0 nm
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Carbon Nanotubes Metal Tapes with Copper (Cu) 13 wt%, Thickness: 22 µm, Dia: 47 mm
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Carbon Nanotubes Metal Films with Copper (Cu) 14 wt%, Thickness: 18 µm, Dia: 47 mm
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Prime CZ-Si Wafer, Size: 6”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 500±25um
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 30-40 nm, Metal Basis
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3”, Thickness: 0.250”
Magnetic Fe2O3@SiO2 powder, Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Positively-charged
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Prime CZ-Si Wafer, Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525±25um
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Prime Si+SiO2 Wafer (dry), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 100 nm
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”, Dark Gray to Black
Borosilicate Wafer, Size: 4”, 2-Side polished, Thickness: 500 ± 20 μm
Graphite Plate, Purity: 99.99%, D: 100mm x 20mm
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Prime FZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 2000 – 4000 (ohm.cm), 1-Side Polished, Thickness: 300 ± 10 μm
Magnetic Fe2O3@SiO2 powder, Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Negatively-charged
Magnetic Fe3O4@SiO2 powder, Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Positively-charged
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 4”, Thickness: 0.125”
Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 1×1 cm
Magnetic Fe3O4@SiO2 powder, Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Negatively-charged
Borosilicate Wafer, Size: 6”, 1-Side polished, Thickness: 700 ± 25 μm
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
18650 Cylinder Cell Case
Platinum Foil, Purity 99.95%, Thickness: 1 mm, 1×1 cm
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
AZ31 Spherical Magnesium Alloy Powder, Size: 15-53 µm, Purity: > 95 %
PE Separator Film for Battery Applications Thickness: 12μm, Width: 60mm, Length: 500 m, 1 roll: 500 m
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Titanium (Ti) Nanopowder/Nanoparticles, Purity:99.9+%, Size: 80-120 nm
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”, White to Gray
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2”, Thickness: 0.250”
CR2016 Coin Cell Cases with 316SS (Positive+Negative Cases), Diameter: 20 mm, Height : 1.6 mm
Water-_17_.webp
Hafnium Diboride Micron Powder, Purity: 99.5 %, Size: 1-3 μm
CR2450 Coin Cell Cases with 316SS (Positive+Negative Cases), Diameter: 24 mm, Height : 5 mm
Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Borosilicate Wafer, Size: 4”, 2-Side polished, Thickness: 200 ± 20 μm
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Borosilicate Wafer, Size: 6”, 2-Side polished, Thickness: 700 ± 20 μm
CR2325 Coin Cell Cases with 316SS (Positive+Negative Cases), Diameter: 23 mm, Height : 2.5 mm
Prime CZ-Si Wafer, Size: 8”, Orientation: (100), Phospor Doped, Resistivity: 0.001-0.005 (ohm.cm), 1-Side Polished, Thickness: 725 ± 20 μm
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”, Grey to Black
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50
(-COOH) Functionalized Double Walled Carbon Nanotubes, Purity: > 65%
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
18650 Nickel Strip for Battery Tab, Width: 4 mm, Thickness: 0.1 mm, 1 Roll: 1 kg
Prime Si+Si3N4 Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 150 nm
Carbon Nanotubes Highly Conductive Films, Thickness: 10-20 µm, Dia: 120-130 mm
Magnetic Fe2O3@SiO2 powder, Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Positively-charged
Magnetic Fe2O3@SiO2 powder, Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Negatively-charged
Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm
Vanadium (V) Micron Powder, Purity: 99.9 %, Size: 325 mesh
Borosilicate Wafer, Size: 6”, 2- Side polished, Thickness: 1100 ± 20 μm
Lithium Cobalt Oxide (LiCoO2) Powder for Li-ion Battery Cathode Application
Prime Si+Si3N4 Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 150 nm
High Quality Natural Agate Mortar and Pestle, Size: 4″
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 4”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Magnetic Fe3O4@SiO2 powder, Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Positively-charged
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Bismuth (Bi) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.250”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Magnetic Fe3O4@SiO2 powder, Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Negatively-charged
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 7”, Thickness: 0.125”
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 8”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1500 nm
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.125”
Magnetic Graphene Aerogel, Content of Fe3O4: 65%, Diameter: 2±0.4 cm
Magnetic Graphene Aerogel, Content of Fe3O4: 50%, Diameter: 2±0.4 cm
Lutetium Oxide (Lu2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh
Magnetic Fe2O3@SiO2 powder, Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Positively-charged
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Ultralight Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.125”
Aluminum Foil for Battery Cathode Substrate, Size: 350 m*280 mm*15 µm
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Graphene Sample Pack (Includes 9 products)
Magnetic Fe3O4@SiO2 powder, Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Positively-charged
Magnetic Fe2O3@SiO2 powder, Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Negatively-charged
Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 0.01 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 500 nm
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”, Dark Gray to Black
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Titanium (Ti) Nanopowder/Nanoparticles, Purity: 99.9+%, Size: 30-80 nm
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Magnetic Fe3O4@SiO2 powder, Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Negatively-charged
Prime Si+Si3N4 Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 525± 25 μm, Coating 70 nm
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”
Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-18 µm
Carbon Nanotubes(CNT) Modified Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Boron (B) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Tungsten (W) Nanopowder/Nanoparticles, Purity: 99.9%, Size: 35-55 nm, Metal Basis
Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Sn:Cu/92:8
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Sn:Cu/1:9
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 5”, Thickness: 0.125”
Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 4”, Thickness: 0.125”
Multi Walled Carbon Nanotubes Ethanol Dispersion, 4 wt%, Purity: > 96 %, OD: 45-75 nm,Length 8-28 µm
Magnetic Fe2O3@SiO2 powder, Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Positively-charged
Prime Si+Si3N4 Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 525± 25 μm, Coating 150 nm
Lithium Titanate (Li2TiO3) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”, Grey to Black
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”, White to Gray
Silicon (Si) Nanopowder/Nanoparticles, Purity: 97+%, Size: 25-35 nm, Oxygen Content: < 3%
Magnetic Fe3O4@SiO2 powder, Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Positively-charged
Ãrün-Görselleri-_6_.webp
Holey Super Graphene
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Magnetic Fe2O3@SiO2 powder, Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Negatively-charged
Cobalt Acetate (C4H6CoO4), Purity: > 98%
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Magnetic Fe3O4@SiO2 powder, Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Negatively-charged
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 3”, Thickness: 0.125”
Gadolinium (Gd) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”
Fused Silica Wafer, Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm
Fused Silica Wafer, Size: 6”, 2-Side Polished, Thickness: 700 ± 25 μm
Prime Si+Si3N4 Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 300 nm
Prime FZ-Si Wafer, Size: 4”, Orientation: (111), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 20 μm
Carbon Nanotube Fibres, Fiber diameter: 60-80 µm, Tensile Strength: 310-500 MPa, Electrical conductivity: 1×10^5~2×10^5 S/m
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Ni:Co/55:28:17
Impending Self-Help Transfer Nickel Graphene Foam, Thickness: 1±0.1 mm, Size: 2×2 cm
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 3”, Thickness: 0.250”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 1”, Thickness: 0.125”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Molybdenum Aluminum Boride (MoAlB) Max Phase Powder, Purity: 99+%, Size: 200 mesh
Magnetic Fe2O3@SiO2 powder, Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Positively-charged
Prime Si+SiO2 Wafer (dry), Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 2-Side Polished, Thickness: 675 ± 15 μm, Coating 200 nm
Prime FZ-Si Wafer, Size: 4”, Orientation: (100), None Doped, Resistivity: 1000 – 10000 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm
Strong Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm
Vanadium (V) Micron Powder, Purity: 99.9 %, Size: 100 mesh
Flash-Ignited Multi-Walled Carbon Nanotubes, MWCNTs: 48 wt%, Fe Nanoparticles: 23 wt%, Amorphous Carbon: 23 wt%
Aluminum Laminated Film, Width: 400 mm, Length: 7.5 m
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Magnetic Fe2O3@SiO2 powder, Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Negatively-charged
Nickel(II) Nitrate Hexahydrate (Ni(NO₃)₂*6H₂O), Purity: > 98%
Silver (Ag) Nanopowder/Nanoparticles Water Dispersion, Size: 15 nm, Tawny Color, 55.000 ppm
Magnetic Fe3O4@SiO2 powder, Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Negatively-charged
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 4”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 2-Propanol, Gamma, Size: 12 nm, 12 wt%
Prime FZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 3000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm
Prime FZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 5000 – 500000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 10 μm
Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Boron Oxide (B2O3) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 50 nm
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 80 ppm Dry powder
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Hand-Held Disc Cutter with Ring Cutting Dies, ID: 8,15,18,20 mm
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Aluminum Nickel Composite Strip for Battery Tab, Width: 4 mm, Thickness: 0.1 mm, 1Roll: 1 kg
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Cobalt (Co) Nanopowder/Nanoparticles, Purity: 99.85%, Size: 28 nm, Carbon Coated
Prime Si+Si3N4 Wafer, Size: 4”, Orientation: (100), Arsenic Doped, Resistivity: 0,001-0,005 (ohm.cm), 1 Side Polished, Thickness: 525± 25 μm, Coating 450 nm
Prime FZ-Si Wafer, Size: 3”, Orientation: (100), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm
Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm
Selenium (Se) Sputtering Targets, elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Carbon Nanotubes Highly Conductive Films with Metal 8%, Thickness: 18 µm, Dia: 47 mm
Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: > 95%, OD: 8-16 nm, Length: 45 µm
Multi Walled Carbon Nanotubes Ethanol Dispersion, 4 wt%, Purity: > 96%, OD: 3-13 nm, Length: 45 µm
Carbon Nanotubes Metal Films with Nickel (Ni) 12 wt%, Thickness: 18 µm, Dia: 47 mm
Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4wt%, Purity: > 96%, OD: 4-12 nm, Length: 55 µm
Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion, 4 wt%, Purity: > 96%, OD: 4-13 nm, Length: 45 µm
Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4 wt%, Purity: > 95%, OD: 18-35 nm, Length: 8-18 µm
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size:3”, Thickness: 0.250”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 1”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 4”, Thickness: 0.250”
Boron Doped Graphene Nanopowder (B/G)
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Quartz Wafer, (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm
Quartz Wafer, (ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm
Carbon Nanotube Wire, Diameter: 30-50 μm, Hardness: 1.0-1.5 GPa
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm
Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Sn:Cu/9:1
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Boron (B) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 3”, Thickness: 0.250”
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Tin (Sn) Sputtering Targets, elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 3”, Thickness: 0.125”
Water-_20_.webp
Diamond (C) Nanopowder/Nanoparticles, Purity: 99%, Size: 10 nm
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 4”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black
Germanium (Ge) Micron Powder, Purity: 99.99 %, Size: 100 mesh
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”
Magnesium (Mg) Micron Powder, Purity: 99.9%, Size: 0-200 µm
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
High Purity Atomized Spherical Magnesium (Mg) Powder NGW120
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Aluminum Laminated Film for Pouch Cell Case
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 4”, Thickness: 0.250”
PTFE Separator Film for Battery Applications Thickness: 50μm, Width: 60mm, Length: 600 m, 1 roll: 600 m
Boron (B) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Carbon Nanotube Sponges, Size: 20 mm x 20 mm, Thickness: 1-2 mm
Tin (Sn) Sputtering Targets, elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 130 ppm Dry powder
Li-Ion Battery Separator Film, Thickness: 25 μm, Width: 60 mm, Length: 500 m, 1 Roll: 500 m
Copper Zinc (Cu-Zn) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Cu:Zn/6:4
Iron Nickel (Fe-Ni) Alloy Nanopowder/Nanoparticles, Size: 30-90 nm, Fe:Ni/5:5
Copper Zinc (Cu-Zn) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Cu:Zn/5:5
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Magnesium (Mg) Micron Powder, Purity: 99.9%, Size: 0-100 µm
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Germanium (Ge) Micron Powder, Purity: 99.99 %, Size: 5 µm
High Purity Atomized Spherical Magnesium (Mg) Powder NGW60
Fullerene-C60, Purity: 95%
Nickel (Ni) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 4”, Thickness: 0.125”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 1”, Thickness: 0.125”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 2”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 2”, Thickness: 0.125”
Carbon Nanotube Sponges, Size: 50 mm x 10 mm, Thickness: 1-2 mm
Carbon Nanotube Fibres, Fiber diameter: 5-12 µm, Tensile Strength: 800-1000 MPa, Electrical conductivity: 5×10^4~7×10^4 S/m
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 8”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Carbon Nanotube Wire, Diameter: 60-100 μm, Hardness: 350-500 MPa
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Carbon Nanotube Wire, Diameter: 120-150 μm, Hardness: 350-500 MPa
Iron (II) Acetate Fe(C2H3O2)2, Purity: > 95%
Nickel Foil, Purity: 99.9+% , Thickness: 0.03mm, Width: 100mm
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Indium (In) Micron Powder, Purity:99.99%, APS:1-5 µm, Spherical
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 5”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Iron Chromium Cobalt (Fe-Cr-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Cr:Co/64:25:11
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 8”, Thickness: 0.250”
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size:4”, Thickness: 0.125”
Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 18 nm, Laser Synthesized
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”, Grey to Black
Tantalum (Ta) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 8”, Thickness: 0.125”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Carbon Nanotube Sponges, Size: 20 mm x 20 mm, Thickness: 3-4 mm
Borosilicate Wafer, Size: 8”, 2-Side Polished, Thickness: 1250 ± 25 μm
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Fullerene-C60, Purity: 98%
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Indium Phosphide (InP) Wafers, Size: 2”, Thickness: 350± 25 μm, Orientation: 100, Single Side Polished, Testing Grade
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 6”, Thickness: 0.125”
Nickel Foil, Purity: 99.9+% , Thickness: 0.08mm, Width: 100mm
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 5”, Thickness: 0.250”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 2”, Thickness: 0.250”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”, White to Gray
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 6”, Thickness: 0.250”
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Prime Si+Si3N4 Wafer, Size: 4”, Orientaion: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 1000 nm
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 4”, Thickness: 0.250”
Antimony (Sb) Sputtering Targets, indium, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Chromium Aluminum Boride (Cr2AlB2) Max Phase Powder, Purity: 99+%, Size: 200 mesh
Shape Memory Polymer NGM9020, Ether Type
Platinum (Pt) Nanopowder/Nanoparticles, Purity: 99.9%, Size: 15 nm
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Copper-Carbon Nanotube Fibers Composite Wires, Cu-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1×10^7 S/m
Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 6”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 6”, Thickness: 0.125”
Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Shape Memory Polymer NGM7520, Ether Type
Fullerene-C60, Purity: 99%
Shape Memory Polymer NGS2520, Solution Type
Indium Phosphide (InP) Wafers, Size: 2”, Thickness: 350±25 μm, Orientation: 100, Single Side Polished, EPI-Ready
High Purity Atomized Spherical Magnesium (Mg) Powder NGW40
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 250 ppm Dry powder
Indium Phosphide (InP) Wafers, Size: 2”, Thickness: 350± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Bismuth Oxide (Bi2O3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Iron Aluminum Boride (Fe2AlB2) Max Phase Powder, Purity: 99+%, Size: 200 mesh
Silver-Carbon Nanotube Fibers Composite Wires, Ag-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1.5×10^7 S/m
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Germanium (Ge) Sputtering Targets, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 1”, Thickness: 0.250”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Gold (Au) Nanopowder/Nanoparticles, Purity: 99.99+%, Size: 50-100 nm
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm
Hafnium Oxide (HfO2) Pellet, Granule Type, Color: Black, Purity: 99.99%, Size: 1-3mm
Hafnium Oxide (HfO2) Pellet, Granule Type, Color: White, Purity:99.99%, Size:1-3mm
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8”, Thickness: 0.125”
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 450±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N Type)
Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Sulphur (S) Nanopowder/Nanoparticles, High Purity: 99.995%, Size: 47 nm
Fullerene-C60, Purity: 99.5%
Shape Memory Polymer NGM6520, Ether Type
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8”, Thickness: 0.250”
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 6”, Thickness: 0.250”
Shape Memory Polymer NGM5520, Ether Type
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Niobium Oxide (Nb2O5) Sputtering Targets, indium, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”, Dark Gray to Black
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Manganese (Mn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”, White to Gray
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Graphene Sheet, Size: 29 cm x 39 cm, Thickness: 35 µm, Highly Conductive
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 6”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Shape Memory Polymer NGM4520, Ether Type
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 38 nm, Metal Basis
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 450 nm
Thermoplastic Carbon Paste, Drying Temperature: <100 °C
Quantum Dots Magnetic Microspheres 615 nm
Quantum Dots Magnetic Microspheres 525 nm
Quantum Dots Microspheres 615 nm
Quantum Dots Microspheres 525 nm
Water Soluble Carbon Quantum Dots 528 nm
Water Soluble Carbon Quantum Dots 515 nm
Water Soluble Carbon Quantum Dots 505 nm
Water Soluble Carbon Quantum Dots 420 nm
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 645 nm
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 625 nm
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 545 nm
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 525 nm
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 500 nm
Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 470 nm
Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm
Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 625 nm
Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 600 nm
Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm
Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready, Dopant: Zinc (P Type)
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Carbon Nanotube Sponges, Size: 50 mm x 10 mm, Thickness: 3-4 mm
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Niobium Oxide (Nb2O5) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Bismuth (Bi) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 78 nm, Metal Basis
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Silver Conductive Paste, Surface Curing: ~80℃
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 400±25 μm, Double Side Polished, EPI-ready
Boron (B) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Thermoplastic Carbon Paste for Long-term Cell Degradation
Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 8”, Thickness: 0.250”
Carbon Nanotube Wire, Diameter: 5-15 μm, Hardness: 1.0-1.5 GPa
High-Performance Copper Foil Rolls for Lithium Ion Battery, Size: 10 µm
Cobalt Oxalate (CoC2O4), Purity: > 98%
High Purity Atomized Spherical Magnesium (Mg) Powder NGW20
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Fullerene-C60, Purity: 99.9%
Meshed Lithium Air CR2032 Coin Cell Case with 304SS, Diameter: 20 mm, Height: 3.2 mm
Thermoset Carbon Paste (140 ℃, 100 ohm/sqr/25µm), 15-20 µm
Thermoset Carbon Paste (140 ℃, 1000 ohm/sqr/25µm, 10-15 µm)
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Thermoplastic Carbon Paste, Drying Temperature: 120˚C for 10 minutes
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness:0.125”
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”
Shape Memory Polymer NGM2520, Ether Type
Thermoset Carbon Paste (140℃, <20 ohm/sqr/25µm), 10-12 µm
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Boron (B) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”
Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Boron (B) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”, Grey to Black
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”, Grey to Black
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 500 ml
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.9%, Size:1”, Thickness: 0.125”
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 8”, Thickness: 0.250”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:1”, Thickness: 0.125”
Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.125”
Gold (Au) Nanopowder/Nanoparticles, Purity: 99.99+%, Size: 28 nm
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Antimony (Sb) Sputtering Targets, elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 8”, Thickness: 0.125”
Antimony (Sb) Sputtering Targets, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 5”, Thickness: 0.125”
Carbon Nanotube Fibres, Fiber Diameter: 5-12 µm, Tensile Strength 1000-1200 MPa, Electrical conductivity 5×10^4~7×10^4 S/m
Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 8”, Thickness: 0.250”
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”, Grey to Black
Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
High-Performance Copper Foil Rolls for Lithium Ion Battery, Size: 25 µm
Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Indium (In) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 70 nm, Tetragonal
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 5”, Thickness: 0.250”
Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 8”, Thickness: 0.250”
Tungsten Disulfide (WS2) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 6”, Thickness: 0.250”
Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”, Beige to White
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Li-Ion Battery Separator Film, Length: 800 m, Width: 85 mm, Thickness: 25 μm
Stainless Steel Two-Electrode Split Test Cell
Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 450 nm
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm
Lithium Titanate (Li2TiO3) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 500 ppm Dry powder
Gold-Carbon Nanotube Fibers Composite Wires, Au-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1×10^7 S/m
Indium Phosphide Quantum (InP/ZnS QD) Dots 625 nm
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 420 nm
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 6”, Thickness: 0.125”
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.9%, Size:1”, Thickness: 0.250”
Gold (Au) Nanopowder/Nanoparticles, Purity: 99.99+%, Size: 14 nm
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 4”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Indium Phosphide Quantum (InP/ZnS QD) Dots 600 nm
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5, Size: 8”, Thickness: 0.250”
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Ytterbium Oxide (Yb2O3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Cobalt (Co) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Electrolyte Lithium Hexafluorophosphate (LiPF6) for Lithium-ion Battery Research Development, 1 Kg in Stainless Steel Container
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Tin (Sn) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”
Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”, Beige to White
Silver Nanowires Suspension in Ethanol, Purity: > 99 wt%, Diameter : 50 nm
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”, White to Gray
Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black
Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 500 ml
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Indium Phosphide Quantum Dots (InP/ZnS QD) 480 nm
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.98%, Size:2”, Thickness: 0.125”
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Cobalt (Co) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Vanadium Oxide (V2O5) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Molybdenum Disulfide (MoS2) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 3”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Shape Memory Polymer NGM3520, Ether Type
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 7”, Thickness: 0.250”
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:1”, Thickness: 0.250”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Aluminum Nitride (AlN) Sputtering Targets, elastomer, Purity: 99.8%, Size: 1”, Thickness: 0.125”
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Lithium (Li) Foil Thickness:0.5 mm, Width: 50 mm, Length: 1000 mm, Purity: 99.9%
Vanadium Oxide (VO2) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 30-60 nm
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.250”
Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 645 nm
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”, Dark Gray to Black
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 2”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 625 nm
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Boron (B) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 640±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N-type)
Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 545 nm
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 6”, Thickness: 0.125”
Cobalt (Co) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”, Grey to Black
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Multi Walled Carbon Nanotubes Array on Monocrystal Silicon, Height: 960 µm
Multi Walled Carbon Nanotubes Array on Monocrystal Silicon, Height: 180 µm
Multi Walled Carbon Nanotubes Array on Polycrystal Silicon, Height: 960 µm
Multi Walled Carbon Nanotubes Array on Quartz, Height: 960 µm
Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 525 nm
Multi Walled Carbon Nanotubes Array on Quartz, Height: 490 µm
Multi Walled Carbon Nanotubes Array on Quartz, Height: 95 µm
Multi Walled Carbon Nanotubes Array on Polycrystal Silicon, Height: 95 µm
Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Carbon Nanotube Fibres, Fiber Diameter: 5-12 µm, Tensile Strength 1200-1500 MPa, Electrical conductivity 5×10^4~7×10^4 S/m
Multi Walled Carbon Nanotubes Array on Monocrystal Silicon, Height: 95 µm
Chromium Oxide (Cr2O3) Sputtering Targets, indium, Purity: 99.8%, Size: 2”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Multi Walled Carbon Nanotubes Array on Polycrystal Silicon, Height: 490 µm
Carbon Nanotube Sponges, Size: 50 mm x 20 mm, Thickness: 1-2 mm
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”
Bismuth Oxide (Bi2O3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:2”, Thickness: 0.125”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 480 nm
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”, Dark Gray to Black
Tantalum (Ta) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Silicon Carbide (SiC) Sputtering Targets, indium, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 460 nm
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Titanium Boride (TiB2) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Indium (In) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”, Beige to White
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Prime CZ-Si Wafer, Size: 8”, Orientation: (100), Boron Doped, Resistivity: 1-100 (ohm.cm), 1-Side Polished, Thickness: 725 ± 25 μm
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
CQD-675-nm.webp
Carbon Quantum Dots (CQD) 675 nm
Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Zinc Oxide (ZnO) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Carbon Quantum Dots (CQD) 630 nm
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Boron (B) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 1000 ppm Dry powder
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.125”
Vanadium (V) Sputtering Targets, indium, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 3”, Thickness: 0.125”
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Antimony (Sb) Sputtering Targets, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready, Mobility: 1000-3000
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready
Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350± 25 μm, Orientation: 100, Single Side Polished, EPI-ready
Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 625±25 μm, Single Side Polished, EPI-ready
Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 350±25 μm, Single Side Polished, EPI-ready
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 6”, Thickness: 0.250”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.9% , Size: 2”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Titanium Nitride (TiN) Sputtering Targets, elastomer, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
565.webp
Carbon Quantum Dots (CQD) 565 nm
Tin Oxide (SnO2) Sputtering Targets, elastomer, Purity: 99.99%, Size:2”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Impending Self-Help Transfer Nickel Graphene Foam, Thickness: 1±0.1 mm, Size: 5×5 cm
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Tin Oxide (SnO2) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh
535.webp
Carbon Quantum Dots (CQD) 535 nm
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Tin Oxide (SnO2) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Titanium Nitride (TiN) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 2”, Thickness: 0.250”
Germanium (Ge) Sputtering Targets, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 1”, Thickness: 0.125”
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Cobalt (Co) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 100 nm
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Bismuth Oxide (Bi2O3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
515.webp
Carbon Quantum Dots (CQD) 515 nm
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”
Lead Sulfide Quantum Dots (PbS QD) 1550 nm
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
505.webp
Carbon Quantum Dots (CQD) 505 nm
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”, Beige to White
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
440.webp
Carbon Quantum Dots (CQD) 440 nm
Lead Sulfide Quantum Dots (PbS QD) 1450 nm
Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 600±25 μm, Double Side Polished, EPI-ready
Perovskite Quantum Dots (CsPbI3) 670 nm
Nickel Oxide (NiO) Sputtering Targets, Purity: 99.9%, Size:2”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Lead Sulfide Quantum Dots (PbS QD) 1350 nm
Fullerene-C70, Purity: 95%
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
420.webp
Carbon Quantum Dots (CQD) 420 nm
Lead Sulfide Quantum Dots (PbS QD) 1250 nm
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Silicon Carbide (SiC) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.250”
Lead Sulfide Quantum Dots (PbS QD) 1150 nm
Perovskite Quantum Dots (CsPbCl3) 410 nm
Perovskite Quantum Dots (CsPbBr3) 510 nm
Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”, Beige to White
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Lead Sulfide Quantum Dots (PbS QD) 1050 nm
Bismuth Ferrite (BiFeO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lead Sulfide Quantum Dots (PbS QD) 950 nm
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Carbon Nanotube Sponges, Size: 50 mm x 20 mm, Thickness: 3-4 mm
Lead Sulfide Quantum Dots (PbS QD) 850 nm
Germanium (Ge) Micron Powder, Purity: 99.99 %, Size: 325 mesh
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size:1”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Aluminum Nitride (AlN) Sputtering Targets, elastomer, Purity: 99.8%, Size: 3”, Thickness: 0.125”
Aluminum Nitride (AlN) Sputtering Targets, elastomer, Purity: 99.8%, Size: 2”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, elastomer, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 7”, Thickness: 0.125”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” , Grey to Black
Strontium Titanate (SrTiO3) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, elastomer, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Fullerene-C70, Purity: 96%
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Gallium Arsenide (GaAs) Wafer, Size: 4”, Thickness: 300± 25 μm, Double Side Polished, EPI-ready
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Boron Carbide (B4C) Sputtering Targets, Indium Bonding, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 7”, Thickness: 0.250”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”
InP-based QLED Quantum Dots 525 nm
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”
Cd-based QLED Quantum Dots 465 nm
Cd-based QLED Quantum Dots 525 nm
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”
Cd-based QLED Quantum Dots 625 nm
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
ZnSe-based QLED Quantum Dots 455 nm
InP-based QLED Quantum Dots 625 nm
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Chromium Oxide (Cr2O3) Sputtering Targets, indium, Purity: 99.8%, Size: 3”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Multi-Layer Accordion-Shaped Titanium Carbide ( Ti3C2Tx) MXene Phase Powder, Purity: 98+%, Size: ~400 mesh
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”, Beige to White
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”, Beige to White
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 3”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Gold Nanostars, Size: 40-45 nm
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black
Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Nickel Oxide (NiO) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Molybdenum Disulfide (MoS2) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Vanadium Oxide (V2O5) Sputtering Targets, elastomer, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Boron (B) Sputtering Targets, indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Titanium Nitride (TiN) Sputtering Targets, indium, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Fullerene-C70, Purity: 98%
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Silicon Carbide (SiC) Sputtering Targets, indium, Purity: 99.5%, Size: 3”, Thickness: 0.125”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Nickel Oxide (NiO) Sputtering Targets, indium, Purity: 99.98%, Size: 2”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Silicon Carbide (SiC) Sputtering Targets, indium, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Molybdenum Disilicide (MoSi2) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Nickel Oxide (NiO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”
Silicon Carbide Wafer (SiC-4H) – 4H , Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80%
Single Walled Carbon Nanotubes Array on Monocrystal Silicon, Height: 95 µm
Single Walled Carbon Nanotubes Array on Quartz, Height: 190 µm
Single Walled Carbon Nanotubes Array on Quartz, Height: 290 µm
Single Walled Carbon Nanotubes Array on Quartz, Height: 95 µm
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lithium Chips for Coin Cell Materials, Diameter: 16 mm, Thickness: 0.6 mm, 1500 pieces
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 5”, Thickness: 0.125”
Molybdenum Disilicide (MoSi2) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Nickel Oxide (NiO) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 4”, Thickness: 0.125”
Fullerene-C70, Purity: 99%
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”, Beige to White
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Manganese (Mn) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%, Size: 4”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Single Walled Carbon Nanotubes Array on Monocrystal Silicon, Height: 190 µm
Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size:4”, Thickness: 0.250”
Calcium Manganate (CaMnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Stainless Steel Three-Electrode Split Test Cell
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 2000 ppm Dry powder
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 5”, Thickness: 0.250”
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”
Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Praseodymium (Pr) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Magnetic Fe3O4@SiO2 powder, Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Positively-charged
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 8”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7”, Thickness: 0.125”
Bismuth Ferrite (BiFeO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Cerium (Ce) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Impending Self-Help Transfer Nickel Graphene Foam, Thickness: 1±0.1 mm, Size: 5×10 cm
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7”, Thickness: 0.250”
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Titanium Nitride (TiN) Sputtering Targets, indium, Purity: 99.5%, Size: 4”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”, Beige to White
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”
Mini Pellet Press
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 8”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 4”, Thickness: 0.125”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”, Beige to White
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.250”
Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”
Glassy Carbon Foam for Battery and Supercapacitor Research, Purity: 95+%, Size: 100 mm x100 mm x 10 mm
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”, Beige to White
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”, Beige to White
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Zinc Selenide Discs, Purity: 99.99%, Dia:20mm, Thickness:3mm, 2-side polished
Indium Phosphide (InP) Wafers, Size: 2”, Thickness: 350± 25 μm, Orientation: 111, Single Side Polished, Testing Grade
Multi-Layer Titanium Carbide (Ti2CTx) MXene Phase Powder, Purity: 98+%, Size: 2-20 µm
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”
Selenium (Se) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: < 100 nm
Silicon Carbide Wafer (SiC-4H)- 4H, Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 95%
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 2”, Thickness: 350 μm, Testing Grade, 4H Area: 80%
Fullerene-C70, Purity: 99.5%
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 3”, Thickness: 350 μm, Production Grade, 4H Area: 100%
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 7”, Thickness: 0.125”
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
5V-10mA Coin Cell Battery Testing System, Dimension ( W*L*H) : 480*330*45 mm
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 4000 ppm Dry powder
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 3”, Thickness: 350 μm, Testing Grade, 4H Area: 95%
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”, Beige to White
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 3”, Thickness: 350 μm, Dummy Grade, 4H Area: 95%
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 7”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”
Gallium Antimonide (GaSb) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 111, Testing Grade
Gallium Antimonide (GaSb) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 100, Testing Grade
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”
High Speed Homogenizer, 27.000 rpm
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”
Silicon Nanowires, Dia: 100-200nm, Length: >10um, Purity: 99%
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4”, Thickness: 0.125”, Beige to White
Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 5×5 cm
Fullerene-C70, Purity: 99.9%
Coin Cell Punching Machine
Indium Phosphide (InP) Wafers, Size: 3”, Thickness: 600± 25 μm, Orientation: 111, Single Side Polished, Testing Grade
Indium Phosphide (InP) Wafers, Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, Testing Grade
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”
Silicon Carbide Wafer (SiC-6H) – 6H , Size: 2”, Thickness: 350 μm, Dummy Grade, Usable Area: 95%
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”
Silicon Carbide Wafer (SiC-4H)- 4H , Size: 4”, Thickness: 350 μm, Dummy Grade, 4H Area: 95%
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 4”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80%
Gallium Antimonide (GaSb) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 111, EPI-Ready
Gallium Antimonide (GaSb) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 100, EPI-Ready
Platinum (Pt) Sputtering Targets, indium, Purity: 99.99%, Size:2”, Thickness: 0.125”
Hydraulic Crimping Machine for All Coin Cells
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 2”, Thickness: 350 μm, Production Grade, 4H Area: 1
Shape Memory Polymer NGP4510, Potting Type
Shape Memory Polymer NGP5510, Potting Type
Shape Memory Polymer NGP3510, Potting Type
Shape Memory Polymer NGP2510, Potting Type
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 4”, Thickness: 350 μm, Mechanical Grade, 4H Area: 100%
Indium Arsenide (InAs) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 100, EPI-Ready
Platinum Foil, Purity 99.95%, Thickness: 1 mm, 5×5 cm
Platinum (Pt) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Indium Phosphide (InP) Wafers, Size: 3”, Thickness: 600± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready
Indium Phosphide (InP) Wafers, Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready
Gallium Antimonide (GaSb) Wafers, Size: 3”, Thickness: 625± 25 μm, Orientation: 100, Testing Grade
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”
Indium Phosphide (InP) Wafers, Size: 4”, Thickness: 625± 25 μm, Orientation: 111, Single Side Polished, Testing Grade
Indium Phosphide (InP) Wafers, Size: 4”, Thickness: 625± 25 μm, Orientation: 100, Single Side Polished, Testing Grade
Indium Phosphide (InP) Wafers, Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready, Dopant: Iron (N Type)
Silicon on Insulator (SOI) Wafers, Size: 4”, Thickness: 725 μm, P type (Boron doped)
Indium Phosphide (InP) Wafers, Size: 3”, Thickness: 600± 25 μm, Orientation: 111 , Single Side Polished, EPI-Ready, Dopant: Iron (N Type)
Electric Coin Cell Hydraulic Crimping Machine
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 3”, Thickness: 350 μm, Research Grade, 4H Area: 95%
Pneumatic Cylindrical Battery Sealing Machine
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”
Silicon Carbide Wafer (SiC-4H) – 4H, Size: 4”, Thickness: 350 μm, Testing Grade, 4H Area: 95%
Ultrasonic Homogenizer
High Energy Ball Mill
Indium Arsenide (InAs) Wafers, Size: 3”, Thickness: 625± 25 μm, Orientation: 100, EPI-Ready
Gallium Antimonide (GaSb) Wafers, Size: 3”, Thickness: 625± 25 μm, Orientation: 100, EPI-Ready
Gallium Antimonide (GaSb) Wafers, Size: 3”, Thickness: 625± 25 μm, Orientation: 111, Testing Grade
Gallium Antimonide (GaSb) Wafers, Size: 3”, Thickness: 625± 25 μm, Orientation: 111, EPI-Ready
Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”
Silicon on Insulator (SOI) Wafers, Size: 6”, Device Thickness: 625 nm, P type
Silicon on Insulator (SOI) Wafers, Size: 8”, Device Thickness: 300 nm, P type
Silicon on Insulator (SOI) Wafers, Size: 8”, Device Thickness: 600 nm, P type
Silicon on Insulator (SOI) Wafers, Size: 6”, Device Thickness: 340 nm, P type
Pneumatic Die Cutting Machine For Battery Electrode Cutting
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”
Gallium Antimonide (GaSb) Wafers, Size: 4”, Thickness: 1000± 25 μm, Orientation: 100, EPI-Ready
Gallium Antimonide (GaSb) Wafers, Size: 4”, Thickness: 1000± 25 μm, Orientation: 111, EPI-Ready
Indium Arsenide (InAs) Wafers, Size: 4”, Thickness: 1000± 25 μm, Orientation: 100, EPI-Ready
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”
Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dry powder
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”
Shape Memory Polymer NGS5520, Solution Type
Shape Memory Polymer NGS4520, Solution Type
Shape Memory Polymer NGS3520, Solution Type
Indium Phosphide (InP) Wafers, Size: 4”, Thickness: 625± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready
Indium Phosphide (InP) Wafers, Size: 4”, Thickness: 625± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready
Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 10×10 cm
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”
Platinum Foil, Purity 99.95%, Thickness: 1 mm, 10×10 cm
Large-Automatic-Film-Coater-_Doctor-Blade_.webp
Large Automatic Film Coater (Doctor Blade)
Platinum (Pt) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”
karbon nanotüpler, grafen, nanoparçacıklar, mikropartiküller, fulleren, iletken yapıştırıcı macun, silikon wafer, yarı iletken wafer, dağılımlar, nadir toprak malzemeler, püskürtme hedefleri, şekil hafıza malzemeleri, 3D yazıcı malzemeleri, laboratuvar ekipmanları, batarya malzemeleri, nanoteknoloji ürünleri, nanoteknoloji malzemeleri, ileri teknoloji malzemeler, enerji depolama çözümleri, araştırma ve geliştirme ekipmanları, kuantum noktalar, yüksek performanslı malzemeler, endüstriyel malzemeler, tıbbi malzemeler, elektronik malzemeler, yenilikçi malzemeler
